Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Circuits for edge ring control in shaped DC pulsed plasma process device

Circuits for edge ring control in shaped DC pulsed plasma process device

US Patent 11289310 · Granted Mar 29, 2022

Estimated economic value: $46,373,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for delivering a plurality of waveform signals during plasm2025
Systems and methods for controlling a voltage waveform at a substrate during pla2025
Plasma uniformity control in pulsed DC plasma chamber2025
Plasma uniformity control in pulsed DC plasma chamber2025
Circuits for edge ring control in shaped dc pulsed plasma process device2025
Circuits for edge ring control in shaped dc pulsed plasma process device2025
Multi-shape voltage pulse trains for uniformity and etch profile tuning2025
Multi-shape voltage pulse trains for uniformity and etch profile tuning2025
Plasma processing assembly using pulsed-voltage and radio-frequency power2025
Plasma processing assembly using pulsed-voltage and radio-frequency power2025
To an inductively coupled plasma source2025
Lift pin mechanism2025