Issued Patents All Time
Showing 25 most recent of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394596 | Plasma uniformity control in pulsed DC plasma chamber | Linying Cui | 2025-08-19 |
| 12334311 | Circuits for edge ring control in shaped dc pulsed plasma process device | Linying Cui | 2025-06-17 |
| 12255051 | Multi-shape voltage pulse trains for uniformity and etch profile tuning | Linying Cui, Daniel Sang Byun, Rajinder Dhindsa, Keith HERNANDEZ | 2025-03-18 |
| 12237148 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more | 2025-02-25 |
| 12217938 | To an inductively coupled plasma source | John Poulose | 2025-02-04 |
| 12211734 | Lift pin mechanism | Alexander SULYMAN, Carlaton WONG, Rajinder Dhindsa, Timothy Joseph Franklin, Steven E. Babayan +2 more | 2025-01-28 |
| 12183557 | Apparatus and methods for controlling ion energy distribution | Linying Cui | 2024-12-31 |
| 12148595 | Plasma uniformity control in pulsed DC plasma chamber | Linying Cui | 2024-11-19 |
| 12125688 | L-motion slit door for substrate processing chamber | Hamid Noorbakhsh | 2024-10-22 |
| 12057292 | Feedback loop for controlling a pulsed voltage waveform | Leonid Dorf, Evgeny Kamenetskiy, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov | 2024-08-06 |
| 11984306 | Plasma chamber and chamber component cleaning methods | Rajinder Dhindsa, Linying Cui | 2024-05-14 |
| 11948780 | Automatic electrostatic chuck bias compensation during plasma processing | Linying Cui, Leonid Dorf | 2024-04-02 |
| 11908661 | Apparatus and methods for manipulating power at an edge ring in plasma process device | Linying Cui | 2024-02-20 |
| 11901157 | Apparatus and methods for controlling ion energy distribution | Linying Cui | 2024-02-13 |
| 11848176 | Plasma processing using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +3 more | 2023-12-19 |
| 11810768 | Temperature and bias control of edge ring | Linying Cui, Rajinder Dhindsa | 2023-11-07 |
| 11798790 | Apparatus and methods for controlling ion energy distribution | Linying Cui | 2023-10-24 |
| 11791138 | Automatic electrostatic chuck bias compensation during plasma processing | Linying Cui, Leonid Dorf | 2023-10-17 |
| 11776789 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more | 2023-10-03 |
| 11728124 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus +1 more | 2023-08-15 |
| 11699572 | Feedback loop for controlling a pulsed voltage waveform | Leonid Dorf, Evgeny Kamenetskiy, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov | 2023-07-11 |
| 11694876 | Apparatus and method for delivering a plurality of waveform signals during plasma processing | Katsumasa Kawasaki | 2023-07-04 |
| 11610759 | Gas splitting by time average injection into different zones by fast gas valves | — | 2023-03-21 |
| 11551916 | Sheath and temperature control of a process kit in a substrate processing chamber | Jaeyong Cho, Rajinder Dhindsa, Anwar Husain | 2023-01-10 |
| 11521828 | Inductively coupled plasma source | John Poulose | 2022-12-06 |