| 12482633 |
Apparatus and method for delivering a plurality of waveform signals during plasma processing |
Kazuo Kawasaki |
2025-11-25 |
|
| 12456611 |
Systems and methods for controlling a voltage waveform at a substrate during plasma processing |
Leonid Dorf, Olivier Luere, Travis Koh, Rajinder Dhindsa, Sunil Srinivasan |
2025-10-28 |
|
| 12394596 |
Plasma uniformity control in pulsed DC plasma chamber |
Linying Cui |
2025-08-19 |
|
| 12334311 |
Circuits for edge ring control in shaped dc pulsed plasma process device |
Linying Cui |
2025-06-17 |
|
| 12255051 |
Multi-shape voltage pulse trains for uniformity and etch profile tuning |
Linying Cui, Daniel Sang Byun, Rajinder Dhindsa, Keith HERNANDEZ |
2025-03-18 |
|
| 12237148 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more |
2025-02-25 |
|
| 12217938 |
To an inductively coupled plasma source |
John Poulose |
2025-02-04 |
|
| 12211734 |
Lift pin mechanism |
Alexander SULYMAN, Carlaton WONG, Rajinder Dhindsa, Timothy Joseph Franklin, Steven E. Babayan +2 more |
2025-01-28 |
|
| 12183557 |
Apparatus and methods for controlling ion energy distribution |
Linying Cui |
2024-12-31 |
$49,330,000 |
| 12148595 |
Plasma uniformity control in pulsed DC plasma chamber |
Linying Cui |
2024-11-19 |
$80,955,000 |
| 12125688 |
L-motion slit door for substrate processing chamber |
Hamid Noorbakhsh |
2024-10-22 |
$83,950,000 |
| 12057292 |
Feedback loop for controlling a pulsed voltage waveform |
Leonid Dorf, Evgeny Kamenetskiy, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov |
2024-08-06 |
$90,312,000 |
| 11984306 |
Plasma chamber and chamber component cleaning methods |
Rajinder Dhindsa, Linying Cui |
2024-05-14 |
$61,768,000 |
| 11948780 |
Automatic electrostatic chuck bias compensation during plasma processing |
Linying Cui, Leonid Dorf |
2024-04-02 |
$42,223,000 |
| 11908661 |
Apparatus and methods for manipulating power at an edge ring in plasma process device |
Linying Cui |
2024-02-20 |
$66,055,000 |
| 11901157 |
Apparatus and methods for controlling ion energy distribution |
Linying Cui |
2024-02-13 |
$47,589,000 |
| 11848176 |
Plasma processing using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +3 more |
2023-12-19 |
$56,890,000 |
| 11810768 |
Temperature and bias control of edge ring |
Linying Cui, Rajinder Dhindsa |
2023-11-07 |
$37,048,000 |
| 11798790 |
Apparatus and methods for controlling ion energy distribution |
Linying Cui |
2023-10-24 |
$34,065,000 |
| 11791138 |
Automatic electrostatic chuck bias compensation during plasma processing |
Linying Cui, Leonid Dorf |
2023-10-17 |
$42,568,000 |
| 11776789 |
Plasma processing assembly using pulsed-voltage and radio-frequency power |
Leonid Dorf, Rajinder Dhindsa, Daniel Sang Byun, Evgeny Kamenetskiy, Yue Guo +4 more |
2023-10-03 |
$34,462,000 |
| 11728124 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Travis Koh, Olivier Luere, Olivier Joubert, Philip Allan Kraus +1 more |
2023-08-15 |
$42,730,000 |
| 11699572 |
Feedback loop for controlling a pulsed voltage waveform |
Leonid Dorf, Evgeny Kamenetskiy, Olivier Luere, Rajinder Dhindsa, Viacheslav Plotnikov |
2023-07-11 |
$39,838,000 |
| 11694876 |
Apparatus and method for delivering a plurality of waveform signals during plasma processing |
Katsumasa Kawasaki |
2023-07-04 |
|
| 11610759 |
Gas splitting by time average injection into different zones by fast gas valves |
— |
2023-03-21 |
$36,722,000 |
