| 12255055 |
Integrated cleaning process for substrate etching |
Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Rajinder Dhindsa |
2025-03-18 |
| 12237149 |
Reducing aspect ratio dependent etch with direct current bias pulsing |
Deyang Li, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu, Jason A. Kenney +5 more |
2025-02-25 |
| 12094752 |
Wafer edge ring lifting solution |
Michael R. Rice, Yogananda Sarode Vishwanath, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more |
2024-09-17 |
| 11996294 |
Cryogenic atomic layer etch with noble gases |
Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park |
2024-05-28 |
| 11521838 |
Integrated cleaning process for substrate etching |
Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Rajinder Dhindsa |
2022-12-06 |
| 11521849 |
In-situ deposition process |
Sang Wook Park, Rajinder Dhindsa, Jonathan Kim, Lin YU, Zhonghua Yao +1 more |
2022-12-06 |
| 11515166 |
Cryogenic atomic layer etch with noble gases |
Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park |
2022-11-29 |
| 11393710 |
Wafer edge ring lifting solution |
Michael R. Rice, Yogananda Sarode Vishwanath, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more |
2022-07-19 |
| 11284500 |
Method of controlling ion energy distribution using a pulse generator |
Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra |
2022-03-22 |
| 11087989 |
Cryogenic atomic layer etch with noble gases |
Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park |
2021-08-10 |
| 11049760 |
Universal process kit |
Olivier Joubert, Jason A. Kenney, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more |
2021-06-29 |
| 10991556 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Leonid Dorf, Rajinder Dhindsa, James Rogers, Denis M. Koosau |
2021-04-27 |
| 10791617 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra |
2020-09-29 |
| 10553404 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Leonid Dorf, Rajinder Dhindsa, James Rogers, Denis M. Koosau |
2020-02-04 |
| 10555412 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra |
2020-02-04 |
| 10504702 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers |
2019-12-10 |
| 10448494 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra |
2019-10-15 |
| 10448495 |
Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra |
2019-10-15 |
| 10103010 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers |
2018-10-16 |
| 9947517 |
Adjustable extended electrode for edge uniformity control |
Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers |
2018-04-17 |
| D797691 |
Composite edge ring |
Olivier Joubert, Jason A. Kenney, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more |
2017-09-19 |
| 8747684 |
Multi-film stack etching with polymer passivation of an overlying etched layer |
Jinhan Choi, Anisul Khan |
2014-06-10 |
| 8187483 |
Method to minimize CD etch bias |
Jason Plumhoff, David Johnson, Russell Westerman |
2012-05-29 |
| 8133817 |
Shallow trench isolation etch process |
Hiroki Sasano, Meihua Shen, Radhika Mani, Daehee Weon, Nicolas Gani +2 more |
2012-03-13 |