Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12255055 | Integrated cleaning process for substrate etching | Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Rajinder Dhindsa | 2025-03-18 |
| 12237149 | Reducing aspect ratio dependent etch with direct current bias pulsing | Deyang Li, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu, Jason A. Kenney +5 more | 2025-02-25 |
| 12094752 | Wafer edge ring lifting solution | Michael R. Rice, Yogananda Sarode Vishwanath, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more | 2024-09-17 |
| 11996294 | Cryogenic atomic layer etch with noble gases | Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park | 2024-05-28 |
| 11521838 | Integrated cleaning process for substrate etching | Yi Zhou, Seul Ki Ahn, Seung-Young Son, Li-Te Chang, Rajinder Dhindsa | 2022-12-06 |
| 11521849 | In-situ deposition process | Sang Wook Park, Rajinder Dhindsa, Jonathan Kim, Lin YU, Zhonghua Yao +1 more | 2022-12-06 |
| 11515166 | Cryogenic atomic layer etch with noble gases | Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park | 2022-11-29 |
| 11393710 | Wafer edge ring lifting solution | Michael R. Rice, Yogananda Sarode Vishwanath, Rajinder Dhindsa, Steven E. Babayan, Olivier Luere +2 more | 2022-07-19 |
| 11284500 | Method of controlling ion energy distribution using a pulse generator | Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra | 2022-03-22 |
| 11087989 | Cryogenic atomic layer etch with noble gases | Alvaro Garcia de Gorordo, Zhonghua Yao, Sang Wook Park | 2021-08-10 |
| 11049760 | Universal process kit | Olivier Joubert, Jason A. Kenney, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more | 2021-06-29 |
| 10991556 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Rajinder Dhindsa, James Rogers, Denis M. Koosau | 2021-04-27 |
| 10791617 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra | 2020-09-29 |
| 10553404 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Rajinder Dhindsa, James Rogers, Denis M. Koosau | 2020-02-04 |
| 10555412 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra | 2020-02-04 |
| 10504702 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers | 2019-12-10 |
| 10448494 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra | 2019-10-15 |
| 10448495 | Method of controlling ion energy distribution using a pulse generator with a current-return output stage | Leonid Dorf, Olivier Luere, Rajinder Dhindsa, James Rogers, Anurag Kumar Mishra | 2019-10-15 |
| 10103010 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers | 2018-10-16 |
| 9947517 | Adjustable extended electrode for edge uniformity control | Olivier Luere, Leonid Dorf, Rajinder Dhindsa, Denis M. Koosau, James Rogers | 2018-04-17 |
| D797691 | Composite edge ring | Olivier Joubert, Jason A. Kenney, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more | 2017-09-19 |
| 8747684 | Multi-film stack etching with polymer passivation of an overlying etched layer | Jinhan Choi, Anisul Khan | 2014-06-10 |
| 8187483 | Method to minimize CD etch bias | Jason Plumhoff, David Johnson, Russell Westerman | 2012-05-29 |
| 8133817 | Shallow trench isolation etch process | Hiroki Sasano, Meihua Shen, Radhika Mani, Daehee Weon, Nicolas Gani +2 more | 2012-03-13 |