| 12237149 |
Reducing aspect ratio dependent etch with direct current bias pulsing |
Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu +5 more |
2025-02-25 |
| 11817312 |
Delayed pulsing for plasma processing of wafers |
Akhil Mehrotra, Vinay Shankar Vidyarthi, Daksh Agarwal, SAMANEH SADIGHI, Rajinder Dhindsa |
2023-11-14 |
| 11551965 |
Apparatus to reduce polymers deposition |
Andrew Nguyen, Xue Yang Chang, Shahid Rauf |
2023-01-10 |
| 11049760 |
Universal process kit |
Olivier Joubert, Sunil Srinivasan, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more |
2021-06-29 |
| 10811226 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2020-10-20 |
| 10249470 |
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2019-04-02 |
| 10170279 |
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2019-01-01 |
| 10131994 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2018-11-20 |
| 9928987 |
Inductively coupled plasma source with symmetrical RF feed |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2018-03-27 |
| 9896769 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2018-02-20 |
| 9870897 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2018-01-16 |
| D797691 |
Composite edge ring |
Olivier Joubert, Sunil Srinivasan, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more |
2017-09-19 |
| 9745663 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2017-08-29 |
| 9449794 |
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna |
Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, Kenneth S. Collins, Yang Yang +2 more |
2016-09-20 |
| 9111722 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator |
Leonid Dorf, Shahid Rauf, Jonathan Liu, Andrew Nguyen, Kenneth S. Collins +2 more |
2015-08-18 |
| 9082591 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator |
Leonid Dorf, Shahid Rauf, Jonathan Liu, Andrew Nguyen, Kenneth S. Collins +2 more |
2015-07-14 |
| 9082590 |
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates |
James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf |
2015-07-14 |
| 8398814 |
Tunable gas flow equalizer |
Ajit Balakrishna, Andrew Nguyen, Kenneth S. Collins |
2013-03-19 |
