Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237149 | Reducing aspect ratio dependent etch with direct current bias pulsing | Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu +5 more | 2025-02-25 |
| 11817312 | Delayed pulsing for plasma processing of wafers | Akhil Mehrotra, Vinay Shankar Vidyarthi, Daksh Agarwal, SAMANEH SADIGHI, Rajinder Dhindsa | 2023-11-14 |
| 11551965 | Apparatus to reduce polymers deposition | Andrew Nguyen, Xue Yang Chang, Shahid Rauf | 2023-01-10 |
| 11049760 | Universal process kit | Olivier Joubert, Sunil Srinivasan, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more | 2021-06-29 |
| 10811226 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2020-10-20 |
| 10249470 | Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-04-02 |
| 10170279 | Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-01-01 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-11-20 |
| 9928987 | Inductively coupled plasma source with symmetrical RF feed | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2018-03-27 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2018-02-20 |
| 9870897 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2018-01-16 |
| D797691 | Composite edge ring | Olivier Joubert, Sunil Srinivasan, James Rogers, Rajinder Dhindsa, Vedapuram S. Achutharaman +1 more | 2017-09-19 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more | 2017-08-29 |
| 9449794 | Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna | Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, Kenneth S. Collins, Yang Yang +2 more | 2016-09-20 |
| 9111722 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Andrew Nguyen, Kenneth S. Collins +2 more | 2015-08-18 |
| 9082591 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Andrew Nguyen, Kenneth S. Collins +2 more | 2015-07-14 |
| 9082590 | Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2015-07-14 |
| 8398814 | Tunable gas flow equalizer | Ajit Balakrishna, Andrew Nguyen, Kenneth S. Collins | 2013-03-19 |