| 12341048 |
Porous plug for electrostatic chuck gas delivery |
Alexander SULYMAN, Anwar Husain, Timothy Joseph Franklin, Joseph F. Sommers |
2025-06-24 |
| D1066275 |
Baffle for anti-rotation process kit for substrate processing chamber |
Rohan Rane, Timothy Joseph Franklin, Daniel Sang Byun |
2025-03-11 |
| 12211734 |
Lift pin mechanism |
Alexander SULYMAN, Carlaton WONG, Rajinder Dhindsa, Timothy Joseph Franklin, Steven E. Babayan +2 more |
2025-01-28 |
| 12198903 |
Plasma resistant arc preventative coatings for manufacturing equipment components |
Joseph F. Sommers, Joseph Behnke, Anwar Husain, Alexander SULYMAN, Timothy Joseph Franklin +1 more |
2025-01-14 |
| 12183605 |
In-situ semiconductor processing chamber temperature apparatus |
Andrew Nguyen, Yogananda SARODE, Kartik Ramaswamy |
2024-12-31 |
| D1049067 |
Ring for an anti-rotation process kit for a substrate processing chamber |
Rohan Rane, Timothy Joseph Franklin, Daniel Sang Byun |
2024-10-29 |
| 12100576 |
Metal oxide preclean chamber with improved selectivity and flow conductance |
Andrew Nguyen, Yu Lei, Xianmin Tang, John C. Forster, Yogananda Sarode Vishwanath +2 more |
2024-09-24 |
| 12020977 |
Lift pin assembly |
Alexander SULYMAN, Anwar Husain, Timothy Joseph Franklin, Carlaton WONG |
2024-06-25 |
| 11835146 |
Symmetric flow valve for flow conductance control |
Andrew Nguyen, Yogananda Sarode Vishwanath, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan |
2023-12-05 |
| 11551965 |
Apparatus to reduce polymers deposition |
Andrew Nguyen, Shahid Rauf, Jason A. Kenney |
2023-01-10 |
| 11211282 |
Apparatus to reduce contamination in a plasma etching chamber |
Andrew Nguyen |
2021-12-28 |
| 11199267 |
Symmetric flow valve for higher flow conductance |
Andrew Nguyen, Yogananda Sarode Vishwanath, Anilkumar Rayaroth, Chetan Naik, Balachandra Jatak Narayan |
2021-12-14 |
| 11069547 |
In-situ temperature measurement for inside of process chamber |
Andrew Nguyen |
2021-07-20 |
| 10847351 |
Plasma chamber with tandem processing regions |
Andrew Nguyen, Yogananda Sarode Vishwanath |
2020-11-24 |
| 10811233 |
Process chamber having tunable showerhead and tunable liner |
Andrew Nguyen, Haitao Wang, Kei-Yu Ko, Reza Sadjadi |
2020-10-20 |
| 10381200 |
Plasma chamber with tandem processing regions |
Andrew Nguyen, Yogananda Sarode Vishwanath |
2019-08-13 |
