| 12205791 |
Rating substrate support assemblies based on impedance circuit electron flow using machine learning |
Arvind Raman, Harikrishnan Rajagopal |
2025-01-21 |
|
| 12142458 |
Symmetric plasma source to generate pie-shaped treatment |
Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, Kallol Bera |
2024-11-12 |
$39,712,000 |
| 12100576 |
Metal oxide preclean chamber with improved selectivity and flow conductance |
Andrew Nguyen, Xue Yang Chang, Yu Lei, Xianmin Tang, Yogananda Sarode Vishwanath +2 more |
2024-09-24 |
$100,019,000 |
| 12080519 |
Smart dynamic load simulator for RF power delivery control system |
Jie Yu, Yue Guo, Kartik Ramaswamy, Tao Zhang, Shahid Rauf +2 more |
2024-09-03 |
$44,731,000 |
| 12027354 |
Cleaning of SIN with CCP plasma or RPS clean |
Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more |
2024-07-02 |
$85,126,000 |
| 12014906 |
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber |
William Johanson, Keith A. Miller, Cheng-Hsiung Tsai, Mukund Sundararajan |
2024-06-18 |
$83,264,000 |
| 11915917 |
Methods and apparatus for reducing sputtering of a grounded shield in a process chamber |
Alan A. Ritchie, Muhammad M. Rasheed |
2024-02-27 |
$57,915,000 |
| 11915918 |
Cleaning of sin with CCP plasma or RPS clean |
Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more |
2024-02-27 |
$57,915,000 |
| 11898236 |
Methods and apparatus for processing a substrate |
Zhiyong Wang, Halbert Chong, Irena H. Wysok, Tiefeng Shi, Gang Fu +9 more |
2024-02-13 |
$47,589,000 |
| 11887818 |
Methods and systems to modulate film stress |
Tsutomu Tanaka, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more |
2024-01-30 |
$39,141,000 |
| 11823871 |
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool |
Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar +3 more |
2023-11-21 |
$39,416,000 |
| 11315769 |
Plasma source for rotating susceptor |
Kallol Bera, Anantha K. Subramani, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen |
2022-04-26 |
$43,127,000 |
| 11315763 |
Shaped electrodes for improved plasma exposure from vertical plasma source |
Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, Tsutomu Tanaka |
2022-04-26 |
$43,127,000 |
| 11170982 |
Methods and apparatus for producing low angle depositions |
Anantha K. Subramani, Praburam Gopal Raja, Steven V. Sansoni, Philip Allan Kraus, Yang Guo +5 more |
2021-11-09 |
$68,627,000 |
| 11158489 |
Methods and systems to modulate film stress |
Tsutomu Tanaka, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more |
2021-10-26 |
$68,163,000 |
| 11133155 |
Apparatus for depositing metal films with plasma treatment |
Daping Yao, Hyman Lam, Jiang Lu, Can Xu, Dien-Yeh Wu +2 more |
2021-09-28 |
$64,178,000 |
| 11081318 |
Geometrically selective deposition of dielectric films utilizing low frequency bias |
Kenichi Ohno, Keiichi Tanaka, Li-Qun Xia, Tsutomu Tanaka, Dmitry A. Dzilno +4 more |
2021-08-03 |
$89,613,000 |
| 10903056 |
Plasma source for rotating susceptor |
Kallol Bera, Anantha K. Subramani, Philip Allan Kraus, Farzad Houshmand, Hanhong Chen |
2021-01-26 |
$35,448,000 |
| 10879042 |
Symmetric plasma source to generate pie shaped treatment |
Anantha K. Subramani, Farzad Houshmand, Philip Allan Kraus, Abhishek Chowdhury, Kallol Bera |
2020-12-29 |
$47,583,000 |
| 10763085 |
Shaped electrodes for improved plasma exposure from vertical plasma source |
Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, Tsutomu Tanaka |
2020-09-01 |
$30,946,000 |
| 10692706 |
Methods and apparatus for reducing sputtering of a grounded shield in a process chamber |
Alan A. Ritchie, Muhammad M. Rasheed |
2020-06-23 |
$29,749,000 |
| 10593521 |
Substrate support for plasma etch operations |
Larry Frazier, Cheng-Hsiung Tsai, Mei Po (Mabel) Yeung, Michael S. Jackson |
2020-03-17 |
$17,260,000 |
| 10453657 |
Apparatus for depositing metal films with plasma treatment |
Daping Yao, Hyman Lam, Jiang Lu, Can Xu, Dien-Yeh Wu +2 more |
2019-10-22 |
$16,291,000 |
| 10121655 |
Lateral plasma/radical source |
Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, Nattaworn Nuntaworanuch, Kallol Bera +2 more |
2018-11-06 |
$24,517,000 |
| 10099245 |
Process kit for deposition and etching |
Zhenbin Ge, Alan A. Ritchie |
2018-10-16 |
$21,789,000 |
