| 12124002 |
Beam deflector metasurface |
Daryl I. Vulis, Brandon J. Hui, Christian Ocier, Shang Wang, Tong Chen +1 more |
2024-10-22 |
$240,844,000 |
| 11333924 |
Displays with direct-lit backlight units |
Wei Lv, Pee Khiam So, Wenyong Zhu, Daming Xu, Victor H. Yin +8 more |
2022-05-17 |
$199,476,000 |
| 11162170 |
Methods for reducing material overhang in a feature of a substrate |
Alan A. Ritchie, Jenn-Yue Wang, Sally S. Lou |
2021-11-02 |
$95,673,000 |
| 10763090 |
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process |
Adolph Miller Allen, Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang +8 more |
2020-09-01 |
$30,946,000 |
| 10667341 |
Light projector with integrated integrity sensor |
Moshe Kriman, Adar Magen, Arun Kumar Nallani Chakravartula, Gregory A. Cohoon, Eamon Han O'Connor +4 more |
2020-05-26 |
$104,456,000 |
| 10591645 |
Electronic devices having scratch-resistant antireflection coatings |
Xianwei Zhao, Wookyung Bae, Sunggu Kang, Ligang Wang, Avery P. Yuen +2 more |
2020-03-17 |
$72,009,000 |
| 10400335 |
Dual-direction chemical delivery system for ALD/CVD chambers |
Chien-Teh Kao, Joel M. Huston, Mei Chang |
2019-09-03 |
$20,988,000 |
| 10400327 |
Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor |
Mohammad Kamruzzaman Chowdhury, Adolph Miller Allen |
2019-09-03 |
$20,988,000 |
| 10334184 |
Electronic device with light diffuser |
Ligang Wang, Miodrag Scepanovic, Neil MacKinnon |
2019-06-25 |
$85,297,000 |
| 10266940 |
Auto capacitance tuner current compensation to control one or more film properties through target life |
Vivek Gupta, Adolph Miller Allen, Ryan Edwin Hanson |
2019-04-23 |
$20,753,000 |
| 10242873 |
RF power compensation to control film stress, density, resistivity, and/or uniformity through target life |
Adolph Miller Allen |
2019-03-26 |
$22,929,000 |
| 10099245 |
Process kit for deposition and etching |
John C. Forster, Alan A. Ritchie |
2018-10-16 |
$21,789,000 |
| D825505 |
Target profile for a physical vapor deposition chamber target |
Ryan Edwin Hanson, Vivek Gupta |
2018-08-14 |
|
| D798248 |
Target profile for a physical vapor deposition chamber target |
Ryan Edwin Hanson, Vivek Gupta |
2017-09-26 |
|
| 9765432 |
Dual-direction chemical delivery system for ALD/CVD chambers |
Chien-Teh Kao, Joel M. Huston, Mei Chang |
2017-09-19 |
$15,798,000 |
| 9759984 |
Adjustable solid film camera aperture |
Tingjun Xu, Jeffrey N. Gleason, Linsen Bie, Ligang Wang, Wookyung Bae +1 more |
2017-09-12 |
$60,773,000 |
| 9611539 |
Crystalline orientation and overhang control in collision based RF plasmas |
Alan A. Ritchie, Adolph Miller Allen |
2017-04-04 |
$16,159,000 |
| 9593410 |
Methods and apparatus for stable substrate processing with multiple RF power supplies |
Alan A. Ritchie |
2017-03-14 |
$16,778,000 |
| 9472443 |
Selectively groundable cover ring for substrate process chambers |
Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, William Johanson, Goichi Yoshidome |
2016-10-18 |
$11,711,000 |
| 9353440 |
Dual-direction chemical delivery system for ALD/CVD chambers |
Chien-Teh Kao, Joel M. Huston, Mei Chang |
2016-05-31 |
$8,928,000 |
| 9218961 |
Methods of forming a metal containing layer on a substrate with high uniformity and good profile control |
Alan A. Ritchie, Adolph Miller Allen |
2015-12-22 |
$10,069,000 |
| 9028659 |
Magnetron design for extended target life in radio frequency (RF) plasmas |
Alan A. Ritchie, Tza-Jing Gung, Vivek Gupta |
2015-05-12 |
$26,933,000 |
| 8865012 |
Methods for processing a substrate using a selectively grounded and movable process kit ring |
Alan A. Ritchie |
2014-10-21 |
$32,207,000 |
| 8268684 |
Method and apparatus for trench and via profile modification |
Mei Chang, Chien-Teh Kao, Xinliang Lu |
2012-09-18 |
$20,649,000 |
| 8252696 |
Selective etching of silicon nitride |
Xinliang Lu, Haichun Yang, Nan Lu, David T. Or, Chien-Teh Kao +1 more |
2012-08-28 |
$5,542,000 |
