| 12368028 |
Apparatus for improved high pressure plasma processing |
Cory Eugene Lafollett, Kirankumar Neelasandra SAVANDAIAH |
2025-07-22 |
| 12014906 |
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber |
Keith A. Miller, Cheng-Hsiung Tsai, John C. Forster, Mukund Sundararajan |
2024-06-18 |
| 11655534 |
Apparatus for reducing tungsten resistivity |
Wenting Hou, Jianxin Lei, Jothilingam Ramalingam, Prashanth Kothnur |
2023-05-23 |
| 11447857 |
Methods and apparatus for reducing tungsten resistivity |
Wenting Hou, Jianxin Lei, Jothilingam Ramalingam, Prashanth Kothnur |
2022-09-20 |
| 11361982 |
Methods and apparatus for in-situ cleaning of electrostatic chucks |
Kirankumar Neelasandra SAVANDAIAH, David Gunther, Prashant Prabhakar Prabhu |
2022-06-14 |
| 11270898 |
Apparatus for enhancing flow uniformity in a process chamber |
Jothilingam Ramalingam, Kirankumar Neelasandra SAVANDAIAH, Fuhong Zhang |
2022-03-08 |
| 11056325 |
Methods and apparatus for substrate edge uniformity |
Thanh X. Nguyen, Alexander Jansen, Yana Cheng, Randal Dean Schmieding, Yong Cao +1 more |
2021-07-06 |
| 11049701 |
Biased cover ring for a substrate processing system |
Adolph Miller Allen, Viachslav Babayan, Zhong Qiang Hua, Carl Johnson, Vanessa Faune +4 more |
2021-06-29 |
| 11024490 |
Magnetron having enhanced target cooling configuration |
Vanessa Faune, Kirankumar Neelasandra SAVANDAIAH |
2021-06-01 |
| D902165 |
Target profile for a physical vapor deposition chamber target |
Kirankumar Neelasandra SAVANDAIAH, Prashant Prabhakar Prabhu |
2020-11-17 |
| D894137 |
Target profile for a physical vapor deposition chamber target |
Kirankumar Neelasandra SAVANDAIAH, Anthony Chih-Tung Chan, Siew Kit Hoi, Prashant Prabhakar Prabhu |
2020-08-25 |
| 10648071 |
Process kit having a floating shadow ring |
Siew Kit Hoi, John Mazzocco, Kirankumar Neelasandra SAVANDAIAH, Prashant Prabhakar Prabhu |
2020-05-12 |
| D877101 |
Target profile for a physical vapor deposition chamber target |
Kirankumar Neelasandra SAVANDAIAH, Prashant Prabhakar Prabhu |
2020-03-03 |
| D851613 |
Target profile for a physical vapor deposition chamber target |
Kirankumar Neelasandra SAVANDAIAH, Anthony Chih-Tung Chan, Siew Kit Hoi, Prashant Prabhakar Prabhu |
2019-06-18 |
| 10283334 |
Methods and apparatus for maintaining low non-uniformity over target life |
Fuhong Zhang, Adolph Miller Allen, Yu Liu |
2019-05-07 |
| 10103012 |
One-piece process kit shield for reducing the impact of an electric field near the substrate |
Kirankumar Neelasandra SAVANDAIAH |
2018-10-16 |
| D825504 |
Target profile for a physical vapor deposition chamber target |
Fuhong Zhang, Yu Liu, Adolph Miller Allen, Brij Datta, Keith A. Miller |
2018-08-14 |
| 9991101 |
Magnetron assembly for physical vapor deposition chamber |
Brij Datta, Fuhong Zhang, Adolph Miller Allen, Yu Liu, Prashanth Kothnur |
2018-06-05 |
| 9953812 |
Integrated process kit for a substrate processing chamber |
Kirankumar Neelasandra SAVANDAIAH, Xin Wang, Prashant Prabhakar Prabhu |
2018-04-24 |
| 9909206 |
Process kit having tall deposition ring and deposition ring clamp |
Kirankumar Neelasandra SAVANDAIAH, Adolph Miller Allen, Xin Wang, Prashant Prabhakar Prabhu |
2018-03-06 |
| D797067 |
Target profile for a physical vapor deposition chamber target |
Fuhong Zhang, Yu Liu, Adolph Miller Allen, Brij Datta, Keith A. Miller |
2017-09-12 |
| 9472443 |
Selectively groundable cover ring for substrate process chambers |
Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, Zhenbin Ge, Goichi Yoshidome |
2016-10-18 |
| 9315891 |
Methods for processing a substrate using multiple substrate support positions |
Joung Joo Lee, Keith A. Miller, Alan A. Ritchie |
2016-04-19 |
| 7737035 |
Dual seal deposition process chamber and process |
Gary Lind, Colin F. Smith, Thomas M. Pratt, John Mazzocco |
2010-06-15 |
| 6405101 |
Wafer centering system and method |
Craig L. Stevens, Steve Kleinke, Damon Tyrone Genetti |
2002-06-11 |
