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Methods and apparatus for depositing amorphous indium tin oxide film |
Yaoying ZHONG, Palaniappan Chidambaram, Jaysen Chiam, Li Ying Choo, Jay Min Soh +2 more |
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| D1053230 |
Sputter target for a physical vapor deposition chamber |
Jay Min Soh, Mengxue Wu, Palaniappan Chidambaram |
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| 12046460 |
Programmable electrostatic chuck to enhance aluminum film morphology |
Yaoying ZHONG, Bridger Earl HOERNER |
2024-07-23 |
| 12037676 |
Programmable ESC to enhance aluminum film morphology |
Yaoying ZHONG, Bridger Earl HOERNER |
2024-07-16 |
| 11784033 |
Methods and apparatus for processing a substrate |
Mengxue Wu, Jay Min Soh, Yue Cui, Chul Nyoung Lee, Palaniappan Chidambaram +1 more |
2023-10-10 |
| 11761078 |
Methods and apparatus for processing a substrate |
Mengxue Wu, Jay Min Soh |
2023-09-19 |
| 11674216 |
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) with controlled cooling |
Yaoying ZHONG, Xinxin Wang, Zheng Min Clarence Chong |
2023-06-13 |
| 11670485 |
Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) |
Zhong Yaoying, Xinxin Wang |
2023-06-06 |
| 11581167 |
Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber |
David Gunther, Kirankumar Neelasandra SAVANDAIAH |
2023-02-14 |
| 11557499 |
Methods and apparatus for prevention of component cracking using stress relief layer |
Yuichi Wada, Kok Wei Tan, Chul Nyoung Lee, Xinxin Wang, Zheng Min Clarence Chong +2 more |
2023-01-17 |
| D908645 |
Sputtering target for a physical vapor deposition chamber |
Kirankumar Neelasandra SAVANDAIAH, David Gunther |
2021-01-26 |
| D894137 |
Target profile for a physical vapor deposition chamber target |
William Johanson, Kirankumar Neelasandra SAVANDAIAH, Anthony Chih-Tung Chan, Prashant Prabhakar Prabhu |
2020-08-25 |
| 10648071 |
Process kit having a floating shadow ring |
William Johanson, John Mazzocco, Kirankumar Neelasandra SAVANDAIAH, Prashant Prabhakar Prabhu |
2020-05-12 |
| D851613 |
Target profile for a physical vapor deposition chamber target |
William Johanson, Kirankumar Neelasandra SAVANDAIAH, Anthony Chih-Tung Chan, Prashant Prabhakar Prabhu |
2019-06-18 |
| 9978639 |
Methods for reducing copper overhang in a feature of a substrate |
Arvind Sundarrajan, Jiao Song |
2018-05-22 |
