| 12148629 |
Shutter disk |
Kang Zhang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Ananthkrishna Jupudi +1 more |
2024-11-19 |
$80,955,000 |
| 12100577 |
High conductance inner shield for process chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2024-09-24 |
$100,019,000 |
| 12080522 |
Preclean chamber upper shield with showerhead |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2024-09-03 |
$44,731,000 |
| 11913107 |
Methods and apparatus for processing a substrate |
Yueh Sheng Ow, Junqi Wei, Kang Zhang, Kelvin Boh |
2024-02-27 |
$57,915,000 |
| 11881385 |
Methods and apparatus for reducing defects in preclean chambers |
Yueh Sheng Ow, Junqi Wei, Kang Zhang, Ananthkrishna Jupudi, Sarath Babu +2 more |
2024-01-23 |
$48,508,000 |
| 11862480 |
Shutter disk |
Kang Zhang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Ananthkrishna Jupudi +1 more |
2024-01-02 |
$40,045,000 |
| 11629409 |
Inline microwave batch degas chamber |
Ribhu Gautam, Ananthkrishna Jupudi, Tuck Foong Koh, Preetham Rao, Vinodh Ramachandran +3 more |
2023-04-18 |
$36,767,000 |
| 11610807 |
Methods and apparatus for cleaving of semiconductor substrates |
Felix Deng, Yueh Sheng Ow, Tuck Foong Koh, Nuno Yen-Chu Chen, Sree Rangasai V. Kesapragada +1 more |
2023-03-21 |
$36,722,000 |
| 11587799 |
Methods and apparatus for processing a substrate |
Chien-Kang HSIUNG, Glen T. Mori |
2023-02-21 |
$24,540,000 |
| 11569122 |
Methods and apparatus for cleaving of semiconductor substrates |
Felix Deng, Yueh Sheng Ow, Tuck Foong Koh, Nuno Yen-Chu Chen, Sree Rangasai V. Kesapragada +1 more |
2023-01-31 |
$29,381,000 |
| 11557499 |
Methods and apparatus for prevention of component cracking using stress relief layer |
Kok Wei Tan, Chul Nyoung Lee, Siew Kit Hoi, Xinxin Wang, Zheng Min Clarence Chong +2 more |
2023-01-17 |
$39,427,000 |
| D973609 |
Upper shield with showerhead for a process chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2022-12-27 |
|
| D971167 |
Lower shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2022-11-29 |
|
| 11359285 |
Substrate processing apparatus, heater and method of manufacturing semiconductor device |
Hitoshi Murata, Takashi Yahata, Takatomo Yamaguchi, Shuhei Saido |
2022-06-14 |
|
| 11289357 |
Methods and apparatus for high voltage electrostatic chuck protection |
Yueh Sheng Ow, Ananthkrishna Jupudi, Clinton GOH, Kai Liang Liew, Sarath Babu |
2022-03-29 |
$46,373,000 |
| 11171017 |
Shutter disk |
Zhang Kang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Ananthkrishna Jupudi +1 more |
2021-11-09 |
$68,627,000 |
| D931241 |
Lower shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2021-09-21 |
|
| 10991617 |
Methods and apparatus for cleaving of semiconductor substrates |
Felix Deng, Yueh Sheng Ow, Tuck Foong Koh, Nuno Yen-Chu Chen, Sree Rangasai V. Kesapragada +1 more |
2021-04-27 |
$107,454,000 |
| D913979 |
Inner shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Junqi Wei, Kelvin Boh +1 more |
2021-03-23 |
|
| 10677830 |
Methods and apparatus for detecting microwave fields in a cavity |
Ananthkrishna Jupudi, Yueh Sheng Ow, Jacob Newman, Preetham Rao, Vinodh Ramachandran |
2020-06-09 |
$53,212,000 |
| 10604839 |
Substrate processing apparatus, method of manufacturing semiconductor device, and method of processing substrate |
Tetsuaki INADA, Mitsunori Ishisaka, Mitsuhiro Hirano, Sadayoshi Horii, Hideharu Itatani +2 more |
2020-03-31 |
|
| 10597780 |
Substrate processing apparatus, heater and method of manufacturing semiconductor device |
Hitoshi Murata, Takashi Yahata, Takatomo Yamaguchi, Shuhei Saido |
2020-03-24 |
|
| 10480069 |
Storage device, vaporizer and substrate processing apparatus |
Naoko Kitagawa |
2019-11-19 |
|
| 9957616 |
Substrate processing apparatus and heating unit |
Hitoshi Murata, Takashi Yahata, Hidenari Yoshida, Shuhei Saido |
2018-05-01 |
|
| 9816182 |
Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium |
Hideto Tateno, Hiroshi Ashihara, Keishin Yamazaki, Takurou Ushida, Iwao Nakamura +1 more |
2017-11-14 |
|
