| 12424481 |
Modular substrate support assembly |
Arvinder Manmohan Singh Chadha, Vijay D. Parkhe, Christopher Laurent Beaudry |
2025-09-23 |
|
| 11587799 |
Methods and apparatus for processing a substrate |
Chien-Kang HSIUNG, Yuichi Wada |
2023-02-21 |
$24,540,000 |
| 11348823 |
Compliant robot blade for substrate support and transfer |
Steven V. Sansoni, Jeffrey A. Brodine |
2022-05-31 |
$62,587,000 |
| 11289387 |
Methods and apparatus for backside via reveal processing |
Prayudi Lianto, Sik Hin Chi, SHIH-CHAO HUNG, Pin Gian Gan, Ricardo Fujii Vinluan +10 more |
2022-03-29 |
$46,373,000 |
| 10629430 |
Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications |
Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Aksel Kitowski +1 more |
2020-04-21 |
$32,079,000 |
| 10431489 |
Substrate support apparatus having reduced substrate particle generation |
Pulkit Agarwal, Song-Moon Suh, Steven V. Sansoni |
2019-10-01 |
$20,010,000 |
| 10312127 |
Compliant robot blade for defect reduction |
Steven V. Sansoni, Jeffrey A. Brodine |
2019-06-04 |
$18,308,000 |
| 9960035 |
Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications |
Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Aksel Kitowski +1 more |
2018-05-01 |
$18,276,000 |
| 9954051 |
Structure and method of fabricating three-dimensional (3D) metal-insulator-metal (MIM) capacitor and resistor in semi-additive plating metal wiring |
Guan Huei See, Chin Hock Toh, Arvind Sundarrajan |
2018-04-24 |
$74,029,000 |
| 9548200 |
Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications |
Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Aksel Kitowski +1 more |
2017-01-17 |
$72,770,000 |
| 9425076 |
Substrate transfer robot end effector |
Pulkit Agarwal, Daniel Greenberg, Song-Moon Suh, Jeffrey A. Brodine, Steven V. Sansoni |
2016-08-23 |
$27,323,000 |
| 9269562 |
In situ chamber clean with inert hydrogen helium mixture during wafer process |
Robert Dinsmore, John C. Forster, Song-Moon Suh, Cheng-Hsiung Tsai |
2016-02-23 |
$9,765,000 |
| 9177782 |
Methods and apparatus for cleaning a substrate |
James M. Holden, Song-Moon Suh, Shalina Sudheeran |
2015-11-03 |
$6,969,000 |
| 9171714 |
Integrated processing of porous dielectric, polymer-coated substrates and epoxy within a multi-chamber vacuum system confirmation |
Yueh Sheng Ow |
2015-10-27 |
$16,675,000 |
| 9147558 |
Finned shutter disk for a substrate process chamber |
Bonnie T. Chia, Song-Moon Suh, Cheng-Hsiung Tsai, Robert Dinsmore |
2015-09-29 |
$14,922,000 |
| 9051655 |
Boron ionization for aluminum oxide etch enhancement |
Kai Wu, Sang Ho Yu, Kie Jin Park, Joshua Collins |
2015-06-09 |
$13,413,000 |
| 6933025 |
Chamber having components with textured surfaces and method of manufacture |
Shyh-Nung Lin, Mark Menzie, Joe Sommers, Daniel Owen Clawson, Lolita Sharp |
2005-08-23 |
$18,503,000 |
| 6777045 |
Chamber components having textured surfaces and method of manufacture |
Shyh-Nung Lin, Mark Menzie, Joe Sommers, Daniel Owen Clawson, Lolita Sharp |
2004-08-17 |
$18,330,000 |
| 6428663 |
Preventing defect generation from targets through applying metal spray coatings on sidewalls |
Roman Mostovoy |
2002-08-06 |
$31,580,000 |
| 6416634 |
Method and apparatus for reducing target arcing during sputter deposition |
Roman Mostovoy |
2002-07-09 |
$129,092,000 |
| 6379428 |
Method for reducing particle concentration within a semiconductor device fabrication tool |
Roman Mostovoy |
2002-04-30 |
$26,677,000 |
| 6228186 |
Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies |
Vikram Pavate, Keith J. Hansen, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman |
2001-05-08 |
$105,222,000 |
| 6171455 |
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
Vikram Pavate, Keith J. Hansen, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman |
2001-01-09 |
$65,370,000 |
| 6126791 |
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target |
Vikram Pavate, Keith J. Hansen, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman |
2000-10-03 |
$78,095,000 |
| 6116032 |
Method for reducing particulate generation from regeneration of cryogenic vacuum pumps |
Daniel Owen Clawson |
2000-09-12 |
$123,501,000 |