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Home › Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target

Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target

US Patent 6171455 · Granted Jan 9, 2001

Estimated economic value: $65,370,000 ⓘ

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