MN

Murali Narasimhan

Applied Materials: 24 patents #504 of 7,310Top 7%
KL Kla-Tencor: 1 patents #316 of 626Top 55%
Overall (All Time): #161,503 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11749537 Side storage pods, equipment front end modules, and methods for operating equipment front end modules Patrick D. Pannese, Paul B. Reuter, Nir Merry 2023-09-05
11569102 Oxidation inhibiting gas in a manufacturing system Patrick D. Pannese, Kunal Jain 2023-01-31
11244844 High flow velocity, gas-purged, side storage pod apparatus, assemblies, and methods Paul B. Reuter, Amulya L. Athayde, Patrick D. Pannese, Dean C. Hruzek, Nir Merry 2022-02-08
9305838 BEOL interconnect with carbon nanotubes Pravin K. Narwankar, JOE GRIFFITH CRUZ, Arvind Sundarrajan, Subbalakshmi Sreekala, Victor L. Pushparaj 2016-04-05
9209074 Cobalt deposition on barrier surfaces Jiang Lu, Hyoung-Chan Ha, Paul F. Ma, Seshadri Ganguli, Joseph AuBuchon +1 more 2015-12-08
9051641 Cobalt deposition on barrier surfaces Jiang Lu, Hyoung-Chan Ha, Paul F. Ma, Seshadri Ganguli, Joseph AuBuchon +1 more 2015-06-09
8835311 High temperature tungsten metallization process Joshua Collins, Jingjing Liu, Sang-Hyeob Lee, Kai Wu, Avgerinos V. Gelatos 2014-09-16
8764961 Cu surface plasma treatment to improve gapfill window Qian Luo, Arvind Sundarrajan, Hua Chung, Xianmin Tang, Jick Yu 2014-07-01
8642473 Methods for contact clean Mei Chang, Linh Thanh, Bo Zheng, Arvind Sundarrajan, John C. Forster +1 more 2014-02-04
8617985 High temperature tungsten metallization process Joshua Collins, Jingjing Liu, Sang-Hyeob Lee, Kai Wu, Avgerinos V. Gelatos 2013-12-31
7050160 Process and apparatus for integrating sheet resistance measurements and reflectance measurements of a thin film in a common apparatus Walter H. Johnson, Jagadish Kalyanam, Shankar Krishnan 2006-05-23
6432819 Method and apparatus of forming a sputtered doped seed layer Vikram Pavate 2002-08-13
6391163 Method of enhancing hardness of sputter deposited copper films Vikram Pavate, Murali Abburi, Seshadri Ramaswami 2002-05-21
6372301 Method of improving adhesion of diffusion layers on fluorinated silicon dioxide Vikram Pavate, Kenny King-Tai Ngan, Xiangbing Li 2002-04-16
6315872 Coil for sputter deposition Vikram Pavate 2001-11-13
6277253 External coating of tungsten or tantalum or other refractory metal on IMP coils Xiangbing Li 2001-08-21
6228186 Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies Vikram Pavate, Keith J. Hansen, Glen T. Mori, Seshadri Ramaswami, Jaim Nulman 2001-05-08
6171455 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Keith J. Hansen, Glen T. Mori, Seshadri Ramaswami, Jaim Nulman 2001-01-09
6139701 Copper target for sputter deposition Vikram Pavate, Seshadri Ramaswami, Murali Abburi 2000-10-31
6126791 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Keith J. Hansen, Glen T. Mori, Seshadri Ramaswami, Jaim Nulman 2000-10-03
6122921 Shield to prevent cryopump charcoal array from shedding during cryo-regeneration Thomas Brezoczky 2000-09-26
6077353 Pedestal insulator for a pre-clean chamber Mohamed Al-Sharif, Bradley O. Stimson, Debabrata Ghosh, Barney M. Cohen, Kenny King-Tai Ngan 2000-06-20
6042700 Adjustment of deposition uniformity in an inductively coupled plasma source Praburam Gopalraja 2000-03-28
6001227 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Keith J. Hansen, Glen T. Mori, Seshadri Ramaswami, Jaim Nulman 1999-12-14
5972178 Continuous process for forming improved titanium nitride barrier layers Kenny King-Tai Ngan, Nitin Khurana, Bradley O. Stimson 1999-10-26