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High-temperature chamber and chamber component cleaning and maintenance method and apparatus |
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Process kit erosion and service life prediction |
Kang-Lie Chiang, Greg Blackburn, Pallavi Zhang, Michael D. Armacost |
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Process kit erosion and service life prediction |
Kang-Lie Chiang, Greg Blackburn, Pallavi Zhang, Michael D. Armacost |
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Method and apparatus for cleaning substrates |
Martin Kranz, Srinivas Guggilla, Suraj Rengarajan, Mei Chang, Gongda Yao +1 more |
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Nitrogen treatment of a metal nitride/metal stack |
Zhi ZHANG, David Pung, Hong Mei Zhang, Roderick C. Mosely |
2002-08-20 |
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Direct temperature control for a component of a substrate processing chamber |
Tushar Mandrekar, Anish Tolia |
2002-08-13 |
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Method and apparatus for sputter etch conditioning a ceramic body |
Vince Burkhart, Steve Sansoni, Vijay D. Parkhe, Eugene Tzou |
2002-05-28 |
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Method for superior step coverage and interface control for high K dielectric capacitors and related electrodes |
Charles Dornfest, John C. Egermeier |
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Heater for processing chamber |
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Method and apparatus for removing processing liquid from a processing liquid path |
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Non-intrusive, on-the-fly (OTF) temperature measurement and monitoring system |
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Method and apparatus for controlling cooling and heating fluids for a gas distribution plate |
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2000-09-12 |
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Continuous process for forming improved titanium nitride barrier layers |
Murali Narasimhan, Kenny King-Tai Ngan, Bradley O. Stimson |
1999-10-26 |
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Modulating surface morphology of barrier layers |
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1999-09-21 |
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Method and apparatus for sputter etch conditioning a ceramic body |
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Variable cell size collimator |
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