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System and method for detecting design and process defects on a wafer using process monitoring features |
Christophe David Fouquet, Zain Saidin, Savitha Nanjangud, Carl Hess |
2017-07-18 |
| 8398832 |
Coils for generating a plasma and for sputtering |
Jaim Nulman, Mani Subramani, Zheng Xu, Howard Grunes, Avi Tepman +2 more |
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| 7893703 |
Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer |
Jeffrey Rzepiela, Yiping Feng, Shiyou Pei, Alexander Kagan, Jianou Shi |
2011-02-22 |
| 7719294 |
Systems configured to perform a non-contact method for determining a property of a specimen |
Amin Samsavar, John M. Schmidt, Rainer Schierle, Gregory S. Horner, Thomas G. Miller +3 more |
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| 7538333 |
Contactless charge measurement of product wafers and control of corona generation and deposition |
Amin Samsavar, John M. Schmidt, Rainer Schierle, Gregory S. Horner, Thomas G. Miller +3 more |
2009-05-26 |
| 7369233 |
Optical system for measuring samples using short wavelength radiation |
Mehrdad Nikoonahad, Shing Lee, Hidong Kwak, Guoheng Zhao, Gary Janik |
2008-05-06 |
| 7345306 |
Corona based charge voltage measurement |
Eric Bouche, Jianou Shi, Shiyou Pei, Xiafang Zhang |
2008-03-18 |
| 7248062 |
Contactless charge measurement of product wafers and control of corona generation and deposition |
Amin Samsavar, John M. Schmidt, Rainer Schierle, Gregory S. Horner, Thomas G. Miller +3 more |
2007-07-24 |
| 7098050 |
Corona based charge voltage measurement |
Eric Bouche, Jianou Shi, Shiyou Pei, Xiafang Zhang |
2006-08-29 |
| 6783639 |
Coils for generating a plasma and for sputtering |
Jaim Nulman, Mani Subramani, Zheng Xu, Howard Grunes, Avi Tepman +2 more |
2004-08-31 |
| 6603269 |
Resonant chamber applicator for remote plasma source |
Be Van Vo, Salvador P. Umotoy, Son Trinh, Lawrence Chung-Lai Lei, Avi Tepman +2 more |
2003-08-05 |
| 6368469 |
Coils for generating a plasma and for sputtering |
Jaim Nulman, Mani Subramani, Zheng Xu, Howard Grunes, Avi Tepman +2 more |
2002-04-09 |
| 6350353 |
Alternate steps of IMP and sputtering process to improve sidewall coverage |
Praburam Gopalraja, Avi Tepman, Peijun Ding, Debabrata Ghosh, Nirmalya Maity |
2002-02-26 |
| 6290865 |
Spin-rinse-drying process for electroplated semiconductor wafers |
Mark Cassidy Cridlin Lloyd, Ashok Sinha, Michael Sugarman |
2001-09-18 |
| 6254746 |
Recessed coil for generating a plasma |
Anantha K. Subramani, John C. Forster, Bradley O. Stimson, Howard Grunes, Avi Tepman +1 more |
2001-07-03 |
| 6254737 |
Active shield for generating a plasma for sputtering |
Mani Subramani |
2001-07-03 |
| 5908334 |
Electrical connector for power transmission in an electrostatic chuck |
Aihua Chen, Vijay D. Parkhe |
1999-06-01 |
| 5796074 |
Wafer heater assembly |
Steven Chen, Vijay D. Parkhe |
1998-08-18 |
| 5691876 |
High temperature polyimide electrostatic chuck |
Aihua Chen, Vijay D. Parkhe |
1997-11-25 |
| 5650052 |
Variable cell size collimator |
Nitin Khurana, Keiji Miyamoto, Roderick C. Mosely, William J. Murphy, Vijay D. Parkhe +2 more |
1997-07-22 |
