ZS

Zain Saidin

KL Kla-Tencor: 14 patents #245 of 1,394Top 20%
KI Kla Instruments: 2 patents #19 of 99Top 20%
📍 Kailua, HI: #11 of 169 inventorsTop 7%
🗺 Hawaii: #81 of 2,560 inventorsTop 4%
Overall (All Time): #275,965 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
9710903 System and method for detecting design and process defects on a wafer using process monitoring features Christophe David Fouquet, Sergio Edelstein, Savitha Nanjangud, Carl Hess 2017-07-18
8804137 Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability DongSub Choi, Amir Widmann, Frank Laske, John Robinson 2014-08-12
7904845 Determining locations on a wafer to be reviewed during defect review Christophe David Fouquet, Gordon Abbott, Ellis Chang 2011-03-08
7646906 Computer-implemented methods for detecting defects in reticle design data Yalin Xiong, Lance Glasser, Carl Hess, Moshe E. Preil 2010-01-12
7440093 Apparatus and methods for providing selective defect sensitivity Yalin Xiong, Sterling Watson 2008-10-21
7303842 Systems and methods for modifying a reticle's optical properties Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski, Larry S. Zurbrick 2007-12-04
7300729 Method for monitoring a reticle Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski 2007-11-27
7300725 Method for determining and correcting reticle variations Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski 2007-11-27
7297453 Systems and methods for mitigating variances on a patterned wafer using a prediction model Sterling Watson, Ady Levy, Chris Mack, Stanley Stokowski 2007-11-20
7271891 Apparatus and methods for providing selective defect sensitivity Yalin Xiong, Sterling Watson 2007-09-18
6844927 Apparatus and methods for removing optical abberations during an optical inspection Stan Stokowski 2005-01-18
6731787 System and method for determining reticle defect printability Anthony Vacca, Thomas Vavul, Donald J. Parker, Sterling Watson, James Wiley 2004-05-04
6381358 System and method for determining reticle defect printability Anthony Vacca, Thomas Vavul, Donald J. Parker, Sterling Watson, James Wiley 2002-04-30
6076465 System and method for determining reticle defect printability Anthony Vacca, Thomas Vavul, Donald J. Parker, Sterling Watson, James Wiley 2000-06-20
5737072 Automated photomask inspection apparatus and method David G. Emery, Mark J. Wihl, Tao-Yi Fu, Marek Zywno, Damon F. Kvamme +1 more 1998-04-07
5563702 Automated photomask inspection apparatus and method David G. Emery, Mark J. Wihl, Tao-Yi Fu, Marek Zywno, Damon F. Kvamme +1 more 1996-10-08
5023528 Method of three-phase winding motor control of rotary motor-driven linear actuators, linear motor-actuated carriages, and similar systems, and apparatus for practicing the same Alexander H. Slocum 1991-06-11