MZ

Marek Zywno

KL Kla-Tencor: 9 patents #207 of 1,394Top 15%
KI Kla Instruments: 3 patents #10 of 99Top 15%
📍 San Jose, CA: #3,821 of 32,062 inventorsTop 15%
🗺 California: #35,036 of 386,348 inventorsTop 10%
Overall (All Time): #276,349 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
9298106 Wafer stage with reciprocating wafer stage actuation control Upendra Ummethala, Layton Hale 2016-03-29
9141002 Z-stage with dynamically driven stage mirror and chuck assembly having constraint Salam Harb, Kent Douglas, James Allen Haslim, Jon Hamilton 2015-09-22
8058628 Substrate processing apparatus and method Noah Bareket 2011-11-15
7897942 Dynamic tracking of wafer motion and distortion during lithography Noah Bareket 2011-03-01
7633070 Substrate processing apparatus and method Noah Bareket 2009-12-15
7342238 Systems, control subsystems, and methods for projecting an electron beam onto a specimen Marian Mankos, Harald F. Hess, Shem-Tov Levi 2008-03-11
6990737 Fluid bearings and vacuum chucks and methods for producing same 2006-01-31
6698735 Fluid bearings and vacuum chucks and methods for producing same 2004-03-02
6584218 Automated photomask inspection apparatus Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme, Michael E. Fein 2003-06-24
6516517 Fluid bearings and vacuum chucks and methods for producing same 2003-02-11
6390677 Fluid bearings and vacuum chucks and methods for producing same 2002-05-21
6363166 Automated photomask inspection apparatus Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme, Michael E. Fein 2002-03-26
6052478 Automated photomask inspection apparatus Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme, Michael E. Fein 2000-04-18
5989444 Fluid bearings and vacuum chucks and methods for producing same 1999-11-23
5737072 Automated photomask inspection apparatus and method David G. Emery, Zain Saidin, Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme +1 more 1998-04-07
5572598 Automated photomask inspection apparatus Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme, Michael E. Fein 1996-11-05
5563702 Automated photomask inspection apparatus and method David G. Emery, Zain Saidin, Mark J. Wihl, Tao-Yi Fu, Damon F. Kvamme +1 more 1996-10-08