Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11733605 | EUV in-situ linearity calibration for TDI image sensors using test photomasks | Haifeng Huang, Rui-fang Shi | 2023-08-22 |
| 11624904 | Vapor as a protectant and lifetime extender in optical systems | David Jalil Zare, Eduardo Soto, I-Fan Wu, Joseph Walsh, Kent McKernan +5 more | 2023-04-11 |
| 11112691 | Inspection system with non-circular pupil | Rui-fang Shi, Daniel Wack, Sseunhyeun Jo, Xin Ye | 2021-09-07 |
| 10168273 | Methods and apparatus for polarizing reticle inspection | Haifeng Huang, Rui-fang Shi, Amrish Kelkar | 2019-01-01 |
| 9625810 | Source multiplexing illumination for mask inspection | Daimian Wang, Daniel Wack, Tao-Yi Fu | 2017-04-18 |
| 9574992 | Single wavelength ellipsometry with improved spot size capability | Esen Salcin, Fuming Wang, Kevin Peterlinz, Hidong Kwak, Uri Greenberg +1 more | 2017-02-21 |
| 9448343 | Segmented mirror apparatus for imaging and method of using the same | Frank Chilese | 2016-09-20 |
| 9318870 | Deep ultra-violet light sources for wafer and reticle inspection systems | Gang Lei | 2016-04-19 |
| 9151718 | Illumination system with time multiplexed sources for reticle inspection | Daimian Wang, Tao-Yi Fu | 2015-10-06 |
| 9046500 | Adaptable illuminating apparatus, system, and method for extreme ultra-violet light | Yanming Zhao | 2015-06-02 |
| 8842272 | Apparatus for EUV imaging and methods of using same | Daniel Wack, John Rogers, James P. McGuire, John M. Rodgers | 2014-09-23 |
| 7926959 | Beam conditioning to reduce spatial coherence | David Alles, Chun-Sheu Lee, Wu Jiang | 2011-04-19 |
| 7738093 | Methods for detecting and classifying defects on a reticle | David Alles, Mark J. Wihl, Stan Stokowski, Yalin Xiong | 2010-06-15 |
| 7486393 | Multiple beam inspection apparatus and method | Robert W. Walsh | 2009-02-03 |
| 7352457 | Multiple beam inspection apparatus and method | Robert W. Walsh | 2008-04-01 |
| 7292393 | Variable illuminator and speckle buster apparatus | — | 2007-11-06 |
| 7075638 | Multiple beam inspection apparatus and method | Robert W. Walsh | 2006-07-11 |
| 6952256 | Optical compensation in high numerical aperture photomask inspection systems for inspecting photomasks through thick pellicles | Ronald L. Roncone | 2005-10-04 |
| 6879390 | Multiple beam inspection apparatus and method | Robert W. Walsh | 2005-04-12 |
| 6727512 | Method and system for detecting phase defects in lithographic masks and semiconductor wafers | Stan Stokowski, Chun-Shen Lee, Donald Pettibone | 2004-04-27 |
| 6646281 | Differential detector coupled with defocus for improved phase defect sensitivity | Matthias C. Krantz, Donald Pettibone, Stan Stokowski | 2003-11-11 |
| 6636301 | Multiple beam inspection apparatus and method | Robert W. Walsh | 2003-10-21 |
| 6584218 | Automated photomask inspection apparatus | Mark J. Wihl, Tao-Yi Fu, Marek Zywno, Michael E. Fein | 2003-06-24 |
| 6363166 | Automated photomask inspection apparatus | Mark J. Wihl, Tao-Yi Fu, Marek Zywno, Michael E. Fein | 2002-03-26 |
| 6052478 | Automated photomask inspection apparatus | Mark J. Wihl, Tao-Yi Fu, Marek Zywno, Michael E. Fein | 2000-04-18 |