DW

Daimian Wang

KL Kla-Tencor: 7 patents #207 of 1,394Top 15%
AM Amazon: 3 patents #5,147 of 19,158Top 30%
AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
Overall (All Time): #398,590 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12353211 System for movement outside of sensor field of view by an autonomous mobile device Yue Hu, Jong Jin Park, Roopesh Athipatla Pattabhi, Jingyu Qiao, Changsheng Shen 2025-07-08
11989026 Speed control system for an autonomous mobile device Chen Wang, Lei Zhu, Miro Yakov Shverdin, Yue Hu, Isabella Talley Lewis +1 more 2024-05-21
11960288 System for path planning in areas outside of sensor field of view by an autonomous mobile device Yue Hu, Jong Jin Park, Roopesh Athipatla Pattabhi, Jingyu Qiao, Changsheng Shen 2024-04-16
10782616 Automatic selection of metrology target measurement recipes Shengrui Zhang, Chi-Hsiang Fan 2020-09-22
10691029 Substrate measurement recipe configuration to improve device matching Ning GU, Jen-Shiang Wang 2020-06-23
9625810 Source multiplexing illumination for mask inspection Daniel Wack, Damon F. Kvamme, Tao-Yi Fu 2017-04-18
9453801 Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems Li-Ping Wang, Yanwei Liu, Alan Aindow 2016-09-27
9348214 Spectral purity filter and light monitor for an EUV reticle inspection system Li-Ping Wang, Frank Chilese, David Alles 2016-05-24
9151718 Illumination system with time multiplexed sources for reticle inspection Tao-Yi Fu, Damon F. Kvamme 2015-10-06
9151881 Phase grating for mask inspection system Oleg Khodykin, Daniel Wack, Li-Ping Wang, Yanwei Liu 2015-10-06
8916831 EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating 2014-12-23
8917432 Multiplexing EUV sources in reticle inspection Daniel Wack, Karl R. Umstadter, Ed Ma, Frank Chilese 2014-12-23