Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12204826 | Method and apparatus for inspection and metrology | Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert +5 more | 2025-01-21 |
| 12182983 | Utilize machine learning in selecting high quality averaged SEM images from raw images automatically | Chen Zhang, Qiang Zhang, Jiao LIANG | 2024-12-31 |
| 11977336 | Method for improving a process for a patterning process | Qian Zhao, Yunbo Guo, Yen-Wen Lu, Mu FENG, Qiang Zhang | 2024-05-07 |
| 11875101 | Method for patterning process modelling | Feng Chen, Matteo Alessandro Francavilla, Jan Wouter Bijlsma | 2024-01-16 |
| 11675274 | Etch bias characterization and method of using the same | Yongfa Fan, Leiwu ZHENG, Mu FENG, Qian Zhao | 2023-06-13 |
| 11614690 | Methods of tuning process models | Mu FENG, Mir Farrokh SHAYEGAN SALEK, Dianwen ZHU, Leiwu ZHENG, Rafael C. Howell | 2023-03-28 |
| 11580274 | Method and apparatus for inspection and metrology | Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert +5 more | 2023-02-14 |
| 11567413 | Method for determining stochastic variation of printed patterns | Chang An Wang, Alvin Wang, Jiao LIANG, Mu FENG | 2023-01-31 |
| 10983440 | Selection of substrate measurement recipes | Jay Jianhui Chen | 2021-04-20 |
| 10948831 | Methods of determining process models by machine learning | Ya Luo, Yu Cao, Yen-Wen Lu | 2021-03-16 |
| 10691029 | Substrate measurement recipe configuration to improve device matching | Ning GU, Daimian Wang | 2020-06-23 |
| 10296681 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2019-05-21 |
| 10007744 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2018-06-26 |
| 9903823 | Metrology method and apparatus | Yen-Wen Lu, Jay Jianhui Chen, Wei-Cheng Liu, Boris Menchtchikov, Te-Chih Huang | 2018-02-27 |
| 9804504 | Method and apparatus for design of a metrology target | Guangqing Chen, Eric Kent, Omer Abubaker Omer Adam | 2017-10-31 |
| 9696635 | Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process | Adrianus Fransiscus Petrus Engelen, Henricus Johannes Lambertus Megens, Johannes Catharinus Hubertus Mulkens, Robert Kazinczi | 2017-07-04 |
| 9494874 | Method and apparatus for design of a metrology target | Guangqing Chen, Shufeng Bai | 2016-11-15 |
| 9355200 | Method and apparatus for design of a metrology target | Guangqing Chen, Eric Kent, Omer Abubaker Omer Adam | 2016-05-31 |
| 7092138 | Elastomer spatial light modulators for extreme ultraviolet lithography | Il Woong Jung, Olav Solgaard | 2006-08-15 |