ME

Martin Ebert

AB Asml Netherlands B.V.: 10 patents #458 of 3,192Top 15%
TH Therma-Wave: 8 patents #13 of 60Top 25%
TL Tokyo Electron Limited: 3 patents #2,069 of 5,567Top 40%
US University Of Southampton: 3 patents #43 of 432Top 10%
NI Nanometrics Incorporated: 2 patents #40 of 127Top 35%
NU North Carolina State University: 1 patents #675 of 1,607Top 45%
Overall (All Time): #133,194 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 25 most recent of 28 patents

Patent #TitleCo-InventorsDate
12339493 Photonic chip and method of manufacture David Thomson, Graham Reed, Wei Zhang 2025-06-24
12204826 Method and apparatus for inspection and metrology Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Pieter Jacob Mathias Hendrik Knelissen +5 more 2025-01-21
12189182 Photonic chip and method of manufacture David Thomson, Graham Reed, Weiwei Zhang 2025-01-07
11874540 Capacitor resonator modulator Weiwei Zhang, Graham Reed, David Thomson, Shinichi Saito 2024-01-16
11580274 Method and apparatus for inspection and metrology Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Pieter Jacob Mathias Hendrik Knelissen +5 more 2023-02-14
11429029 Method and apparatus for illumination adjustment Maurits Van Der Schaar, Patrick Warnaar, Youping Zhang, Arie Jeffrey Den Boef, Feng Xiao 2022-08-30
10620550 Metrology method and apparatus Martin Jacobus Johan Jak, Arie Jeffrey Den Boef, Nitesh Pandey 2020-04-14
10379445 Metrology method, target and substrate Martin Jacobus Johan Jak, Arie Jeffrey Den Boef 2019-08-13
10338401 Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method Gerbrand Van Der Zouw, Martin Jacobus Johan Jak 2019-07-02
10254658 Metrology method, target and substrate Daan Maurits Slotboom, Arie Jeffrey Den Boef 2019-04-09
10133188 Metrology method, target and substrate Martin Jacobus Johan Jak, Arie Jeffrey Den Boef 2018-11-20
9753296 Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method Gerbrand Van Der Zouw, Martin Jacobus Johan Jak 2017-09-05
8830472 Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Marcus Adrianus Van De Kerkhof, Henricus Petrus Maria Pellemans 2014-09-09
8259296 Scanning focal length metrology Richard A. Yarussi 2012-09-04
7697135 Scanning focal length metrology Richard A. Yarussi 2010-04-13
7342661 Method for noise improvement in ellipsometers Lanhua Wei 2008-03-11
7321427 Multiple beam ellipsometer Li Chen 2008-01-22
7136164 Multiple beam ellipsometer Li Chen 2006-11-14
7030984 Fast wafer positioning method for optical metrology Ilya Chizhov 2006-04-18
6985228 Multiple beam ellipsometer Li Chen 2006-01-10
6952261 System for performing ellipsometry using an auxiliary pump beam to reduce effective measurement spot size 2005-10-04
6952258 Wafer chuck with integrated reference sample Thomas Traber 2005-10-04
6798512 Multiple beam ellipsometer Li Chen 2004-09-28
6757059 Wafer chuck with integrated reference sample Thomas Traber 2004-06-29
6747746 System and method for finding the center of rotation of an R-theta stage Ilya Chizhov 2004-06-08