Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429328 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2025-09-30 |
| 11650047 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar +1 more | 2023-05-16 |
| 11549651 | Eye-safe laser-based lighting | Marcellinus Petrus Carolus Michael Krijn | 2023-01-10 |
| 11428521 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2022-08-30 |
| 11385552 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Kaustuve Bhattacharyya | 2022-07-12 |
| 11300883 | Method to determine a patterning process parameter | Simon Gijsbert Josephus Mathijssen, Kaustuve Bhattacharyya, Won-Jae Jang, Jinmoo Byun | 2022-04-12 |
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2021-12-21 |
| 11106142 | Metrology recipe selection | Kaustuve Bhattacharyya, Arie Jeffrey Den Boef | 2021-08-31 |
| 11009343 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar +1 more | 2021-05-18 |
| 10831109 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Kaustuve Bhattacharyya | 2020-11-10 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10656533 | Metrology in lithographic processes | Simon Gijsbert Josephus Mathijssen, Kaustuve Bhattacharyya | 2020-05-19 |
| 10656534 | Method of measuring, device manufacturing method, metrology apparatus, and lithographic system | Nitesh Pandey, Jin LIAN, SAMEE UR-REHMAN | 2020-05-19 |
| 10635004 | Correction using stack difference | Aiqin JIANG, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Hans Van Der Laan, Bart Visser | 2020-04-28 |
| 10634490 | Determining edge roughness parameters | Richard Quintanilha, Arie Jeffrey Den Boef, Michael Kubis | 2020-04-28 |
| 10620550 | Metrology method and apparatus | Martin Ebert, Arie Jeffrey Den Boef, Nitesh Pandey | 2020-04-14 |
| 10551308 | Focus control arrangement and method | Armand Eugene Albert Koolen, Gerbrand Van Der Zouw, Dirk Broddin | 2020-02-04 |
| 10527953 | Metrology recipe selection | Kaustuve Bhattacharyya, Arie Jeffrey Den Boef | 2020-01-07 |
| 10481506 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Murat Bozkurt, Maurits Van Der Schaar, Patrick Warnaar, Mohammadreza Hajiahmadi, Grzegorz Grzela +1 more | 2019-11-19 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2019-08-20 |
| 10379445 | Metrology method, target and substrate | Arie Jeffrey Den Boef, Martin Ebert | 2019-08-13 |
| 10338401 | Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method | Gerbrand Van Der Zouw, Martin Ebert | 2019-07-02 |
| 10310389 | Method of measuring, device manufacturing method, metrology apparatus, and lithographic system | Nitesh Pandey, Jin LIAN, Samee Ur Rehman | 2019-06-04 |
| 10289008 | Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus | — | 2019-05-14 |
| 10162272 | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Te-Chih Huang, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren | 2018-12-25 |