Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij, Armand Eugene Albert Koolen +7 more | 2021-04-20 |
| 10795269 | Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method | Zili Zhou, Nitesh Pandey, Markus Gerardus Martinus Maria Van Kraaij, Martinus Hubertus Maria Van Weert, Anagnostis Tsiatmas +2 more | 2020-10-06 |
| 10551308 | Focus control arrangement and method | Martin Jacobus Johan Jak, Armand Eugene Albert Koolen, Dirk Broddin | 2020-02-04 |
| 10534274 | Method of inspecting a substrate, metrology apparatus, and lithographic system | Teunis Willem Tukker, Amandev Singh | 2020-01-14 |
| 10437159 | Measurement system, lithographic system, and method of measuring a target | Teunis Willem Tukker, Amandev Singh | 2019-10-08 |
| 10423077 | Metrology method and apparatus, computer program and lithographic system | Nitesh Pandey, Zili Zhou, Armand Eugene Albert Koolen | 2019-09-24 |
| 10338401 | Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method | Martin Jacobus Johan Jak, Martin Ebert | 2019-07-02 |
| 10303064 | Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method | Sebastianus Adrianus GOORDEN, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Jonas Mertes | 2019-05-28 |
| 10215954 | Focus monitoring arrangement and inspection apparatus including such an arrangement | — | 2019-02-26 |
| 10191391 | Metrology method and apparatus, computer program and lithographic system | Nitesh Pandey, Zili Zhou, Armand Eugene Albert Koolen | 2019-01-29 |
| 10126237 | Inspection apparatus and device manufacturing method | — | 2018-11-13 |
| 9753296 | Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method | Martin Jacobus Johan Jak, Martin Ebert | 2017-09-05 |
| 9357626 | Photon source, metrology apparatus, lithographic system and device manufacturing method | Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Jozef Johannes Gerardus Anna Maria SMEETS | 2016-05-31 |
| 8921814 | Photon source, metrology apparatus, lithographic system and device manufacturing method | Henricus Petrus Maria Pellemans, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Johannes Matheus Marie De Wit, Ralph Josef Johannes Gerardus Anna M Smeets | 2014-12-30 |
| 8553218 | Calibration method and apparatus | Patricius Aloysius Jacobus Tinnemans, Henricus Petrus Maria Pellemans, Willem Marie Julia Marcel Coene | 2013-10-08 |
| 8384881 | Lithographic apparatus, stage apparatus and device manufacturing method | Joost Jeroen Ottens, Dirk-Jan Bijvoet, Frederik Eduard De Jong | 2013-02-26 |
| 7773235 | Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus | Haico Victor Kok, Koen Kivits, Ron Van De Laak, Johannes Maria Kuiper, Hoite Pieter Theodoor Tolsma | 2010-08-10 |
| 7409302 | Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus | Haico Victor Kok, Koen Kivits, Ron Van De Laak, Johannes Maria Kuiper, Hoite Pieter Theodoor Tolsma | 2008-08-05 |
| 6891598 | Lithographic device and method for wafer alignment with reduced tilt sensitivity | — | 2005-05-10 |