Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2024-11-12 |
| 12124174 | Metrology method and apparatus, computer program and lithographic system | Paul Turner | 2024-10-22 |
| 11947269 | Method and apparatus to determine a patterning process parameter | Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2024-04-02 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2023-10-10 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +5 more | 2023-07-25 |
| 11604419 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Joannes Jitse Venselaar, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss +3 more | 2023-03-14 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-10-12 |
| 11143972 | Method and apparatus to determine a patterning process parameter | Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2021-10-12 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 11022897 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Joannes Jitse Venselaar, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss +3 more | 2021-06-01 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Bert Verstraeten | 2020-12-22 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +5 more | 2020-10-20 |
| 10795269 | Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method | Zili Zhou, Gerbrand Van Der Zouw, Nitesh Pandey, Markus Gerardus Martinus Maria Van Kraaij, Martinus Hubertus Maria Van Weert +2 more | 2020-10-06 |
| 10782617 | Method and apparatus to determine a patterning process parameter | Elliott Gerard McNamara | 2020-09-22 |
| 10747122 | Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method | Alok Verma, Bert Verstraeten | 2020-08-18 |
| 10677589 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Bert Verstraeten | 2020-06-09 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2020-04-07 |
| 10585354 | Method of optimizing a metrology process | Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Bastiaan Onne Fagginger Auer, Martijn Maria Zaal +1 more | 2020-03-10 |
| 10585048 | Method of determining a value of a parameter of interest of a target formed by a patterning process | Samee Ur Rehman, Sergey Tarabrin, Joannes Jitse Venselaar, Alexandru ONOSE, Mariya Vyacheslavivna Medvedyeva | 2020-03-10 |
| 10571363 | Method of determining an optimal focus height for a metrology apparatus | Mariya Vyacheslavivna Medvedyeva, Hugo Augustinus Joseph Cramer, Martinus Hubertus Maria Van Weert, Bastiaan Onne Fagginger Auer, Xiaoxin Shang +2 more | 2020-02-25 |