Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2024-11-12 |
| 11947269 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Paul Christiaan Hinnen, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2024-04-02 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2023-10-10 |
| 11774862 | Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus | Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Rizvi Rahman +3 more | 2023-10-03 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +5 more | 2023-07-25 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more | 2022-07-12 |
| 11175591 | Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus | Hakki Ergün Cekli, Masashi Ishibashi, Wendy Johanna Martina Van De Ven, Willem Seine Christian Roelofs, Rizvi Rahman +3 more | 2021-11-16 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2021-10-12 |
| 11143972 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Paul Christiaan Hinnen, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2021-10-12 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 10996570 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more | 2021-05-04 |
| 10955744 | Method of determining a parameter of a pattern transfer process, device manufacturing method | Koen Van Witteveen, Wei Wang, Paul Turner, Giacomo Miceli | 2021-03-23 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +5 more | 2020-10-20 |
| 10782617 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas | 2020-09-22 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2020-04-07 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2020-01-28 |
| 10453758 | Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Alok Verma, Thomas Theeuwes +1 more | 2019-10-22 |