Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2024-11-12 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2023-10-10 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +5 more | 2023-07-25 |
| 11175592 | Methods and apparatus for inspection of a structure and associated apparatuses | Elie BADR, Shawn Shakahwat Millat, Giacomo Miceli | 2021-11-16 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2021-10-12 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2021-08-24 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2021-08-17 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10937413 | Techniques for model training for voice features | Jonathan B. Feinstein, Amina Shabbeer, Brandon Scott Durham, Catherine Breslin, Edward C. Bueche +6 more | 2021-03-02 |
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten | 2020-12-22 |
| 10854189 | Techniques for model training for voice features | Jonathan B. Feinstein, Amina Shabbeer, Brandon Scott Durham, Catherine Breslin, Edward C. Bueche +6 more | 2020-12-01 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +5 more | 2020-10-20 |
| 10747122 | Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method | Anagnostis Tsiatmas, Bert Verstraeten | 2020-08-18 |
| 10677589 | Substrate, metrology apparatus and associated methods for a lithographic process | Hugo Augustinus Joseph Cramer, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten | 2020-06-09 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2020-04-07 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2020-01-28 |
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2019-11-19 |
| 10453758 | Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes +1 more | 2019-10-22 |
| 10379446 | Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes | Sinatra Canggih KHO, Adriaan Johan Van Leest | 2019-08-13 |
| 9965576 | Accommodating engineering change orders in integrated circuit design | Ayan Datta, Saurabh Gupta, Jayaprakash Udhayakumar, Rajesh Veerabhadraiah | 2018-05-08 |
| 9953121 | Accommodating engineering change orders in integrated circuit design | Ayan Datta, Saurabh Gupta, Jayaprakash Udhayakumar, Rajesh Veerabhadraiah | 2018-04-24 |
| 9952517 | Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method | Hugo Augustinus Joseph Cramer | 2018-04-24 |