Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429328 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2025-09-30 |
| 11526085 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar | 2022-12-13 |
| 11466980 | Metrology method and apparatus, lithographic system, device manufacturing method and substrate | Maurits Van Der Schaar, Kaustuve Bhattacharyya | 2022-10-11 |
| 11428521 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2022-08-30 |
| 11392043 | Method and metrology apparatus for determining estimated scattered radiation intensity | Seyed Iman Mossavat, Remco Dirks | 2022-07-19 |
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2021-12-21 |
| 11181828 | Method of determining a value of a parameter of interest of a patterning process, device manufacturing method | Patrick Warnaar, Hilko Dirk Bos, Mohammadreza Hajiahmadi, Lukasz Jerzy Macht, Karel Hendrik Wouter VAN DEN BOS +2 more | 2021-11-23 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 10739687 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar | 2020-08-11 |
| 10725386 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2020-07-28 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2020-07-21 |
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2019-11-19 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Maurits Van Der Schaar, Arie Jeffrey Den Boef +7 more | 2019-08-20 |
| 10331043 | Optimization of target arrangement and associated target | Henricus Wilhelmus Maria Van Buel, Johannes Marcus Maria Beltman, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2019-06-25 |
| 10331041 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2019-06-25 |
| 10162271 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar | 2018-12-25 |
| 10162272 | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Te-Chih Huang, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren | 2018-12-25 |
| 10126662 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2018-11-13 |
| 10042268 | Method, apparatus and substrates for lithographic metrology | Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Martin Jacobus Johan Jak | 2018-08-07 |
| 9946167 | Metrology method and inspection apparatus, lithographic system and device manufacturing method | Arno Jan Bleeker, Willem Marie Julia Marcel Coene, Patrick Warnaar, Michael Kubis | 2018-04-17 |
| 9910366 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij | 2018-03-06 |
| 9879988 | Metrology method and apparatus, computer program and lithographic system | Xing Lan Liu, Yue-Lin Peng, Hakki Ergün Cekli, Josselin Pello, Richard Johannes Franciscus Van Haren | 2018-01-30 |
| 9811003 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Armand Eugene Albert Koolen | 2017-11-07 |
| 9719945 | Metrology method and apparatus, lithographic system and device manufacturing method | Omer Abubaker Omer Adam | 2017-08-01 |
| 9714827 | Metrology method and apparatus, lithographic system, device manufacturing method and substrate | Maurits Van Der Schaar, Kaustuve Bhattacharyya | 2017-07-25 |