Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11556060 | Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus | Seyed Iman Mossavat, Remco Dirks, Alexandru ONOSE, Hugo Augustinus Joseph Cramer | 2023-01-17 |
| 11526085 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Davit Harutyunyan, Patrick Warnaar | 2022-12-13 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10739687 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Davit Harutyunyan, Patrick Warnaar | 2020-08-11 |
| 10599047 | Metrology apparatus, lithographic system, and method of measuring a structure | Janneke Ravensbergen, Nitesh Pandey, Zili Zhou, Armand Eugene Albert Koolen, Sebastianus Adrianus GOORDEN +1 more | 2020-03-24 |
| 10585354 | Method of optimizing a metrology process | Anagnostis Tsiatmas, Joannes Jitse Venselaar, Samee Ur Rehman, Mariya Vyacheslavivna Medvedyeva, Martijn Maria Zaal +1 more | 2020-03-10 |
| 10571363 | Method of determining an optimal focus height for a metrology apparatus | Mariya Vyacheslavivna Medvedyeva, Anagnostis Tsiatmas, Hugo Augustinus Joseph Cramer, Martinus Hubertus Maria Van Weert, Xiaoxin Shang +2 more | 2020-02-25 |
| 10488768 | Beat patterns for alignment on small metrology targets | Paul Christiaan Hinnen, Hugo Augustinus Joseph Cramer, Anagnostis Tsiatmas, Mariya Vyacheslavivna Medvedyeva | 2019-11-26 |
| 10394135 | Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus | Hugo Augustinus Joseph Cramer | 2019-08-27 |
| 10317805 | Method for monitoring a characteristic of illumination from a metrology apparatus | Jolanda Theodora Josephina Schmetz-Schagen, Hugo Augustinus Joseph Cramer, Armand Eugene Albert Koolen | 2019-06-11 |
| 10162271 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Davit Harutyunyan, Patrick Warnaar | 2018-12-25 |