Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405535 | Method for filtering an image and associated metrology apparatus | Justin Kreuzer, Nikhil Mehta, Patrick Warnaar, Vasco Tomas Tenner, Patricius Aloysius Jacobus Tinnemans +1 more | 2025-09-02 |
| 12366811 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more | 2025-07-22 |
| 12276921 | Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method | Olger Victor Zwier, Maurits Van Der Schaar, Hilko Dirk Bos, Hans Van Der Laan, S. M. Masudur Rahman Al Arif +6 more | 2025-04-15 |
| 12007700 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more | 2024-06-11 |
| 11415900 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more | 2022-08-16 |
| 11150563 | Method of measuring a parameter of a patterning process, metrology apparatus, target | Sergei Sokolov, Sergey Tarabrin, Su-Ting CHENG, Markus Franciscus Antonius Eurlings, Koenraad Remi André Maria Schreel | 2021-10-19 |
| 11099489 | Method of measuring a parameter of a lithographic process, metrology apparatus | Hugo Augustinus Joseph Cramer, Hilko Dirk Bos, Erik Johan Koop, Han-Kwang Nienhuys, Alessandro Polo +2 more | 2021-08-24 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10895812 | Metrology apparatus, lithographic system, and method of measuring a structure | Nitesh Pandey | 2021-01-19 |
| 10866526 | Metrology method and device | Yevgeniy Konstantinovich Shmarev, Nitesh Pandey | 2020-12-15 |
| 10852247 | Variable corrector of a wave front | Stanislav Smirnov, Johannes Matheus Marie De Wit, Teunis Willem Tukker | 2020-12-01 |
| 10816909 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene +1 more | 2020-10-27 |
| 10788757 | Metrology method and apparatus, computer program and lithographic system | Su-Ting CHENG, Sergei Sokolov | 2020-09-29 |
| 10678145 | Radiation receiving system | Alessandro Polo, Nitesh Pandey | 2020-06-09 |
| 10598483 | Metrology method, apparatus and computer program | Sergey Tarabrin, Simon Philip Spencer Hastings | 2020-03-24 |
| 10599048 | Metrology apparatus, method of measuring a structure, device manufacturing method | Sergey Tarabrin | 2020-03-24 |
| 10599047 | Metrology apparatus, lithographic system, and method of measuring a structure | Janneke Ravensbergen, Nitesh Pandey, Zili Zhou, Sebastianus Adrianus GOORDEN, Bastiaan Onne Fagginger Auer +1 more | 2020-03-24 |
| 10551308 | Focus control arrangement and method | Martin Jacobus Johan Jak, Gerbrand Van Der Zouw, Dirk Broddin | 2020-02-04 |
| 10495889 | Beam homogenizer, illumination system and metrology system | Markus Franciscus Antonius Eurlings, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov | 2019-12-03 |
| 10423077 | Metrology method and apparatus, computer program and lithographic system | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw | 2019-09-24 |
| 10317805 | Method for monitoring a characteristic of illumination from a metrology apparatus | Jolanda Theodora Josephina Schmetz-Schagen, Hugo Augustinus Joseph Cramer, Bastiaan Onne Fagginger Auer | 2019-06-11 |
| 10191391 | Metrology method and apparatus, computer program and lithographic system | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw | 2019-01-29 |
| 10107761 | Method and device for focusing in an inspection system | Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov, Chien-Hung Tseng | 2018-10-23 |
| 9811003 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde | 2017-11-07 |
| 9535338 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde | 2017-01-03 |