Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12276921 | Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method | Olger Victor Zwier, Maurits Van Der Schaar, Hans Van Der Laan, S. M. Masudur Rahman Al Arif, Henricus Wilhelmus Maria Van Buel +6 more | 2025-04-15 |
| 12105432 | Metrology method and associated computer product | Narjes JAVAHERI, Maurits Van Der Schaar, Tieh-Ming Chang, Patrick Warnaar, Samira Bahrami +3 more | 2024-10-01 |
| 11181828 | Method of determining a value of a parameter of interest of a patterning process, device manufacturing method | Patrick Warnaar, Hendrik Jan Hidde Smilde, Mohammadreza Hajiahmadi, Lukasz Jerzy Macht, Karel Hendrik Wouter VAN DEN BOS +2 more | 2021-11-23 |
| 11099489 | Method of measuring a parameter of a lithographic process, metrology apparatus | Hugo Augustinus Joseph Cramer, Erik Johan Koop, Armand Eugene Albert Koolen, Han-Kwang Nienhuys, Alessandro Polo +2 more | 2021-08-24 |
| 10795269 | Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method | Zili Zhou, Gerbrand Van Der Zouw, Nitesh Pandey, Markus Gerardus Martinus Maria Van Kraaij, Martinus Hubertus Maria Van Weert +2 more | 2020-10-06 |
| 9786044 | Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method | Andreas Fuchs, Peter Hanzen Wardenier, Amandev Singh, Maxime D'Alfonso | 2017-10-10 |