Issued Patents All Time
Showing 1–25 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405535 | Method for filtering an image and associated metrology apparatus | Armand Eugene Albert Koolen, Justin Kreuzer, Nikhil Mehta, Patrick Warnaar, Vasco Tomas Tenner +1 more | 2025-09-02 |
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2024-11-12 |
| 12007697 | Method for process metrology | Bert Verstraeten, Thomas Theeuwes | 2024-06-11 |
| 11982946 | Metrology targets | Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Olger Victor Zwier, Jeroen COTTAAR +1 more | 2024-05-14 |
| 11940739 | Metrology apparatus | Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler +4 more | 2024-03-26 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2023-10-10 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +5 more | 2023-07-25 |
| 11650047 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Patrick Warnaar, Grzegorz Grzela +1 more | 2023-05-16 |
| 11556060 | Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus | Seyed Iman Mossavat, Bastiaan Onne Fagginger Auer, Remco Dirks, Alexandru ONOSE | 2023-01-17 |
| 11520239 | Separation of contributions to metrology data | Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy ANUNCIADO, Marinus Jochemsen +2 more | 2022-12-06 |
| 11385551 | Method for process metrology | Bert Verstraeten, Thomas Theeuwes | 2022-07-12 |
| 11262661 | Metrology apparatus | Nitesh Pandey, Arie Jeffrey Den Boef, Duygu Akbulut, Marinus Johannes Maria Van Dam, Hans Butler +4 more | 2022-03-01 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-10-12 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more | 2021-08-24 |
| 11099489 | Method of measuring a parameter of a lithographic process, metrology apparatus | Hilko Dirk Bos, Erik Johan Koop, Armand Eugene Albert Koolen, Han-Kwang Nienhuys, Alessandro Polo +2 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2021-08-17 |
| 11009343 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Patrick Warnaar, Grzegorz Grzela +1 more | 2021-05-18 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10955756 | Method of measuring a target, metrology apparatus, lithographic cell, and target | — | 2021-03-23 |
| 10901323 | Metrology method and apparatus with increased bandwidth | Seyed Iman Mossavat, Paul Christiaan Hinnen | 2021-01-26 |
| 10871367 | Substrate, metrology apparatus and associated methods for a lithographic process | Alok Verma, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten | 2020-12-22 |
| 10845713 | Metrology method and apparatus, computer program and lithographic system | Thomas Theeuwes | 2020-11-24 |