HC

Hugo Augustinus Joseph Cramer

AB Asml Netherlands B.V.: 68 patents #37 of 3,192Top 2%
AN Asml Holding N.V.: 2 patents #214 of 520Top 45%
U.S. Philips: 2 patents #2,537 of 8,851Top 30%
FA Felten & Guilleaume Carlswerk Aktiengesellschaft: 1 patents #9 of 20Top 45%
Overall (All Time): #28,421 of 4,157,543Top 1%
71
Patents All Time

Issued Patents All Time

Showing 26–50 of 71 patents

Patent #TitleCo-InventorsDate
10811323 Method and apparatus to determine a patterning process parameter Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +5 more 2020-10-20
10732514 Metrology method and apparatus with increased bandwidth Seyed Iman Mossavat, Paul Christiaan Hinnen 2020-08-04
10677589 Substrate, metrology apparatus and associated methods for a lithographic process Alok Verma, Thomas Theeuwes, Anagnostis Tsiatmas, Bert Verstraeten 2020-06-09
10627213 Statistical hierarchical reconstruction from metrology data Seyed Iman Mossavat, Remco Dirks 2020-04-21
10615084 Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more 2020-04-07
10571363 Method of determining an optimal focus height for a metrology apparatus Mariya Vyacheslavivna Medvedyeva, Anagnostis Tsiatmas, Martinus Hubertus Maria Van Weert, Bastiaan Onne Fagginger Auer, Xiaoxin Shang +2 more 2020-02-25
10546790 Method and apparatus to determine a patterning process parameter Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more 2020-01-28
10488768 Beat patterns for alignment on small metrology targets Bastiaan Onne Fagginger Auer, Paul Christiaan Hinnen, Anagnostis Tsiatmas, Mariya Vyacheslavivna Medvedyeva 2019-11-26
10481503 Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more 2019-11-19
10453758 Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma +1 more 2019-10-22
10394135 Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus Bastiaan Onne Fagginger Auer 2019-08-27
10317805 Method for monitoring a characteristic of illumination from a metrology apparatus Jolanda Theodora Josephina Schmetz-Schagen, Armand Eugene Albert Koolen, Bastiaan Onne Fagginger Auer 2019-06-11
10180628 Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Maurits Van Der Schaar, Te-Chih Huang 2019-01-15
10156797 Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method Seyed Iman Mossavat, Maurits Van Der Schaar 2018-12-18
10151985 Process flagging and cluster detection without requiring reconstruction Remco Dirks, Seyed Iman Mossavat 2018-12-11
10132763 Inspection method and apparatus, lithographic system and device manufacturing method Robert John Socha, Patricius Aloysius Jacobus Tinnemans, Jean-Pierre Agnes Henricus Marie Vaessen 2018-11-20
9977340 Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods and apparatus Maria Johanna Hendrika Aben, Noelle Martina Wright, Ruben Alvarez Sanchez, Martijn Jaap Daniel Slob 2018-05-22
9964853 Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method Peter Clement Paul Vanoppen, Eric Brouwer, Jan Hendrik Den Besten, Adrianus Franciscus Petrus Engelen, Paul Christiaan Hinnen 2018-05-08
9952517 Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method Alok Verma 2018-04-24
9760018 Method and inspection apparatus and computer program product for assessing a quality of reconstruction of a value of a parameter of interest of a structure Seyed Iman Mossavat, Willem Jan Grootjans, Adriaan Johan Van Leest 2017-09-12
9436099 Lithographic focus and dose measurement using a 2-D target Christian Marinus Leewis, Marcus Adrianus Van De Kerkhof, Johannes Anna Quaedackers, Christine Corinne Mattheus 2016-09-06
9188875 Calibration method, inspection method and apparatus, lithographic apparatus, and lithographic processing cell Maurits Van Der Schaar 2015-11-17
9182682 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method Paul Christiaan Hinnen 2015-11-10
9128065 Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans 2015-09-08
9081303 Methods and scatterometers, lithographic systems, and lithographic processing cells Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Hendrik Jan Hidde Smilde, Adrianus Johannes Hendrikus Schellekens, Michael Kubis 2015-07-14