Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322660 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2025-06-03 |
| 12142535 | Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2024-11-12 |
| 11947269 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2024-04-02 |
| 11784098 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2023-10-10 |
| 11733610 | Method and system to monitor a process apparatus | Wim Tjibbo Tel, Mark John Maslow, Frank Staals | 2023-08-22 |
| 11728224 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2023-08-15 |
| 11710668 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +5 more | 2023-07-25 |
| 11604419 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Joannes Jitse Venselaar, Anagnostis Tsiatmas, Samee Ur Rehman, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss +3 more | 2023-03-14 |
| 11520239 | Separation of contributions to metrology data | Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy ANUNCIADO, Marinus Jochemsen +2 more | 2022-12-06 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more | 2022-07-12 |
| 11314174 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Laurentius Cornelius De Winter, Roland Pieter Stolk, Frank Staals, Anton Bernhard Van Oosten, Marinus Jochemsen +2 more | 2022-04-26 |
| 11143972 | Method and apparatus to determine a patterning process parameter | Anagnostis Tsiatmas, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy +2 more | 2021-10-12 |
| 11145557 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-10-12 |
| 11101185 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11101184 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2021-08-24 |
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest +3 more | 2021-08-17 |
| 11022897 | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets | Joannes Jitse Venselaar, Anagnostis Tsiatmas, Samee Ur Rehman, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss +3 more | 2021-06-01 |
| 10996570 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Maurits Van Der Schaar +6 more | 2021-05-04 |
| 10983445 | Method and apparatus for measuring a parameter of interest using image plane detection techniques | Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij +7 more | 2021-04-20 |
| 10901323 | Metrology method and apparatus with increased bandwidth | Hugo Augustinus Joseph Cramer, Seyed Iman Mossavat | 2021-01-26 |
| 10811323 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +5 more | 2020-10-20 |
| 10732514 | Metrology method and apparatus with increased bandwidth | Hugo Augustinus Joseph Cramer, Seyed Iman Mossavat | 2020-08-04 |
| 10615084 | Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2020-04-07 |
| 10571806 | Method and system to monitor a process apparatus | Wim Tjibbo Tel, Mark John Maslow, Frank Staals | 2020-02-25 |
| 10546790 | Method and apparatus to determine a patterning process parameter | Adriaan Johan Van Leest, Anagnostis Tsiatmas, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes +1 more | 2020-01-28 |