Issued Patents All Time
Showing 1–25 of 124 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429328 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2025-09-30 |
| 12321101 | Method for applying a deposition model in a semiconductor manufacturing process | Maxim PISARENCO, Huaichen ZHANG, Marie-Claire VAN LARE | 2025-06-03 |
| 12276921 | Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method | Olger Victor Zwier, Hilko Dirk Bos, Hans Van Der Laan, S. M. Masudur Rahman Al Arif, Henricus Wilhelmus Maria Van Buel +6 more | 2025-04-15 |
| 12242203 | Target for measuring a parameter of a lithographic process | Patrick Warnaar, Franciscus Godefridus Casper Bijnen, Olger Victor Zwier | 2025-03-04 |
| 12204826 | Method and apparatus for inspection and metrology | Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert +5 more | 2025-01-21 |
| 12105432 | Metrology method and associated computer product | Narjes JAVAHERI, Tieh-Ming Chang, Hilko Dirk Bos, Patrick Warnaar, Samira Bahrami +3 more | 2024-10-01 |
| 12066764 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner | 2024-08-20 |
| 12019377 | Target for measuring a parameter of a lithographic process | Olger Victor Zwier, Patrick Warnaar | 2024-06-25 |
| 11982946 | Metrology targets | Nikhil Mehta, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier, Jeroen COTTAAR +1 more | 2024-05-14 |
| 11709436 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner | 2023-07-25 |
| 11698346 | Methods and apparatus for monitoring a manufacturing process, inspection apparatus, lithographic system, device manufacturing method | Ioana Sorina Barbu, Murat Bozkurt, Alberto Da Costa Assafrao | 2023-07-11 |
| 11580274 | Method and apparatus for inspection and metrology | Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert +5 more | 2023-02-14 |
| 11525786 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2022-12-13 |
| 11480884 | Method for optimization of a lithographic process | Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Frank Staals, Franciscus Hendricus Arnoldus Elich | 2022-10-25 |
| 11466980 | Metrology method and apparatus, lithographic system, device manufacturing method and substrate | Kaustuve Bhattacharyya, Hendrik Jan Hidde Smilde | 2022-10-11 |
| 11429029 | Method and apparatus for illumination adjustment | Patrick Warnaar, Youping Zhang, Arie Jeffrey Den Boef, Feng Xiao, Martin Ebert | 2022-08-30 |
| 11428521 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2022-08-30 |
| 11392044 | Method of determining a position of a feature | Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan +3 more | 2022-07-19 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Elliott Gerard McNamara +6 more | 2022-07-12 |
| 11320745 | Measuring a process parameter for a manufacturing process involving lithography | Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang, Youping Zhang | 2022-05-03 |
| 11221560 | Method and apparatus for design of a metrology target | Guangqing Chen, Wei-Cheng Liu | 2022-01-11 |
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2021-12-21 |
| 11187995 | Metrology using a plurality of metrology target measurement recipes | Victor Emanuel Calado, Youping Zhang, Richard Johannes Franciscus Van Haren, Xing Lan Liu | 2021-11-30 |
| 11126093 | Focus and overlay improvement by modifying a patterning device | Richard Johannes Franciscus Van Haren, Reiner Maria Jungblut, Leon Paul VAN DIJK, Willem Seine Christian Roelofs, Wim Tjibbo Tel +1 more | 2021-09-21 |
| 11125806 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner | 2021-09-21 |