Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11525786 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2022-12-13 |
| 10955353 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2021-03-23 |
| 10656536 | Substrate support, method for loading a substrate on a substrate support location, lithographic apparatus and device manufacturing method | Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas POIESZ +5 more | 2020-05-19 |
| 10241055 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2019-03-26 |
| 9368366 | Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers | Sander Frederik Wuister, Tamara Druzhinina | 2016-06-14 |
| 8980724 | Alignment target contrast in a lithographic double patterning process | Harry Sewell, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2015-03-17 |
| 8945800 | Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program | Tsann-Bim Chiou, Alek Chi-Heng Chen | 2015-02-03 |
| 8760662 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2014-06-24 |
| 8709908 | Improving alignment target contrast in a lithographic double patterning process | Harry Sewell, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-04-29 |
| 8625096 | Method and system for increasing alignment target contrast | Harry Sewell, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-01-07 |
| 8612045 | Optimization method and a lithographic cell | Everhardus Cornelis Mos, Jozef Maria Finders, Christianus Gerardus Maria De Mol, Scott Anderson Middlebrooks, Dongzi Wangli | 2013-12-17 |
| 8553230 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2013-10-08 |
| 8329366 | Apparatus and method for providing resist alignment marks in a double patterning lithographic process | Maya Angelova Doytcheva, Richard Johannes Franciscus Van Haren, Harry Sewell, Robertus Wilhelmus Van Der Heijden | 2012-12-11 |
| 8189195 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Irwan Dani Setija | 2012-05-29 |
| 8054467 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2011-11-08 |
| 7916284 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer | 2011-03-29 |
| 7791724 | Characterization of transmission losses in an optical system | Arie Jeffrey Den Boef, Wilhelmus Maria Corbeij, Markus Gerardus Martinus Maria Van Kraaij | 2010-09-07 |
| 7791727 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Antoine Gaston Marie Kiers, Maurits Van Der Schaar | 2010-09-07 |
| 7791732 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2010-09-07 |
| 7786477 | Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method | Axel Nackaerts, Gustaaf Verhaegen | 2010-08-31 |
| 7704850 | Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method | Axel Nackaerts, Gustaaf Verhaegen | 2010-04-27 |
| 7564555 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Maurits Van Der Schaar, Stefan Carolus Jacobus Antonius Keij | 2009-07-21 |
| 7532307 | Focus determination method, device manufacturing method, and mask | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Antoine Gaston Marie Kiers | 2009-05-12 |
| 7480050 | Lithographic system, sensor, and method of measuring properties of a substrate | Arie Jeffrey Den Boef, Wilhelmus Maria Corbeij, Reinder Teun Plug | 2009-01-20 |
| 7466413 | Marker structure, mask pattern, alignment method and lithographic method and apparatus | Jozef Maria Finders, Richard Johannes Franciscus Van Haren, Luis Alberto Colina Santamaria Colina, Eric Henri Jan Hendrickx, Geert Vandenberghe +1 more | 2008-12-16 |