Issued Patents All Time
Showing 1–25 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429328 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2025-09-30 |
| 12287584 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2025-04-29 |
| 12254392 | Apparatus and method for property joint interpolation and prediction | Faegheh Hasibi, Leon Paul VAN DIJK, Maialen LARRANAGA, Alexander Ypma | 2025-03-18 |
| 12189308 | Method for adjusting a target feature in a model of a patterning process based on local electric fields | Leon Paul VAN DIJK, Oktay Yildirim, Orion Jonathan Pierre Mouraille | 2025-01-07 |
| 11940740 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2024-03-26 |
| 11619884 | Method for adjusting a target feature in a model of a patterning process based on local electric fields | Leon Paul VAN DIJK, Oktay Yildirim, Orion Jonathan Pierre Mouraille | 2023-04-04 |
| 11493851 | Lithographic method and lithographic apparatus | Hakki Ergün Cekli, Xing Lan Liu, Stefan Cornelis Theodorus Van Der Sanden | 2022-11-08 |
| 11428521 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2022-08-30 |
| 11385550 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2022-07-12 |
| 11320750 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Victor Emanuel Calado, Xing Lan Liu | 2022-05-03 |
| 11300888 | Methods of determining stress in a substrate, control system for controlling a lithographic process, lithographic apparatus and computer program product | Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN | 2022-04-12 |
| 11300887 | Method to change an etch parameter | Victor Emanuel Calado, Leon Paul VAN DIJK, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more | 2022-04-12 |
| 11300889 | Metrology apparatus | Leon Paul VAN DIJK, Subodh Singh, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Amandev Singh | 2022-04-12 |
| 11294294 | Alignment mark positioning in a lithographic process | Leon Paul VAN DIJK, Orion Jonathan Pierre Mouraille, Anne Marie Pastol | 2022-04-05 |
| 11226567 | Methods and apparatus for use in a device manufacturing method | Leon Paul VAN DIJK, Ilya MALAKHOVSKY, Ronald Henricus Johannes OTTEN, Mahdi SADEGHINIA | 2022-01-18 |
| 11204239 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2021-12-21 |
| 11187995 | Metrology using a plurality of metrology target measurement recipes | Victor Emanuel Calado, Youping Zhang, Maurits Van Der Schaar, Xing Lan Liu | 2021-11-30 |
| 11156923 | Lithographic method and lithographic apparatus | Hakki Ergün Cekli, Xing Lan Liu, Stefan Cornelis Theodorus Van Der Sanden | 2021-10-26 |
| 11126093 | Focus and overlay improvement by modifying a patterning device | Reiner Maria Jungblut, Leon Paul VAN DIJK, Willem Seine Christian Roelofs, Wim Tjibbo Tel, Stefan Hunsche +1 more | 2021-09-21 |
| 11099486 | Generating predicted data for control or monitoring of a production process | Alexander Ypma, Dimitra GKOROU, Georgios TSIROGIANNIS, Thomas Leo Maria Hoogenboom | 2021-08-24 |
| 11054813 | Method and apparatus for controlling an industrial process using product grouping | Alexander Ypma, David Deckers, Franciscus Godefridus Casper Bijnen, Weitian Kou | 2021-07-06 |
| 11036148 | Patterning device cooling system and method of thermally conditioning a patterning device | Hakki Ergün Cekli, Güneş Nakibo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme | 2021-06-15 |
| 11036146 | Method and apparatus to reduce effects of nonlinear behavior | Everhardus Cornelis Mos, Peter Ten Berge, Peter Hanzen Wardenier, Erik Weber Jensen, Hakki Ergün Cekli | 2021-06-15 |
| 10915689 | Method and apparatus to correct for patterning process error | Peter Ten Berge, Everhardus Cornelis Mos, Peter Hanzen Wardenier, Erik Weber Jensen, Bernardo Kastrup +5 more | 2021-02-09 |
| 10788761 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Victor Emanuel Calado, Xing Lan Liu | 2020-09-29 |