Issued Patents All Time
Showing 26–50 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10719011 | Method and apparatus to correct for patterning process error | Peter Ten Berge, Daan Maurits Slotboom, Peter Hanzen Wardenier | 2020-07-21 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2020-07-21 |
| 10691863 | Method and apparatus to correct for patterning process error | Peter Ten Berge, Everhardus Cornelis Mos, Peter Hanzen Wardenier, Erik Weber Jensen | 2020-06-23 |
| 10642162 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2020-05-05 |
| 10545410 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Masashi Ishibashi, Leon Paul VAN DIJK, Xing Lan Liu, Reiner Maria Jungblut +2 more | 2020-01-28 |
| 10495986 | Patterning device cooling system and method of thermally conditioning a patterning device | Hakki Ergün Cekli, Güneş Nakibo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme | 2019-12-03 |
| 10474045 | Lithographic apparatus and device manufacturing method | Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma, Irina Lyulina +6 more | 2019-11-12 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2019-08-20 |
| 10331043 | Optimization of target arrangement and associated target | Henricus Wilhelmus Maria Van Buel, Johannes Marcus Maria Beltman, Xing Lan Liu, Hendrik Jan Hidde Smilde | 2019-06-25 |
| 10324379 | Lithographic apparatus and method | Cedric Affentauschegg, Milenko Jovanovic, Reiner Maria Jungblut, Robertus Wilhelmus Van Der Heijden | 2019-06-18 |
| 10274834 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2019-04-30 |
| 10162272 | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde, Te-Chih Huang, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel | 2018-12-25 |
| 10061212 | Metrology target, method and apparatus, target design method, computer program and lithographic system | Maurits Van Der Schaar, Everhardus Cornelis Mos, Youping Zhang | 2018-08-28 |
| 10025193 | Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product | Hakki Ergün Cekli, Xing Lan Liu, Daan Maurits Slotboom, Wim Tjibbo Tel, Stefan Cornelis Theodorus Van Der Sanden | 2018-07-17 |
| 9946165 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2018-04-17 |
| 9879988 | Metrology method and apparatus, computer program and lithographic system | Xing Lan Liu, Hendrik Jan Hidde Smilde, Yue-Lin Peng, Hakki Ergün Cekli, Josselin Pello | 2018-01-30 |
| 9753377 | Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus | Hakki Ergün Cekli, Irina Lyulina, Manfred Gawein Tenner, Stefan Cornelis Theodorus Van Der Sanden | 2017-09-05 |
| 9506743 | Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method | Arie Jeffrey Den Boef, Justin Kreuzer, Simon Gijsbert Josephus Mathijssen, Gerrit Johannes Nijmeijer, J. Christian Swindal +1 more | 2016-11-29 |
| 9291916 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Stefan Cornelis Theodorus Van Der Sanden, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei, Irina Lyulina +1 more | 2016-03-22 |
| 8982347 | Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus | Xiuhong Wei, Franciscus Godefridus Casper Bijnen, Marcus Adrianus Van De Kerkhof, Everhardus Cornelis Mos, Hubertus Johannes Gertrudus Simons +4 more | 2015-03-17 |
| 8982329 | Method and apparatus for measuring line end shortening, substrate and patterning device | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Marcus Adrianus Van De Kerkhof | 2015-03-17 |
| 8980724 | Alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2015-03-17 |
| 8976355 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Stefan Cornelis Theodorus Van Der Sanden, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei, Michael Kubis +1 more | 2015-03-10 |
| 8722179 | Substrate comprising a mark | Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken | 2014-05-13 |
| 8709908 | Improving alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-04-29 |