Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9753377 | Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus | Hakki Ergün Cekli, Irina Lyulina, Richard Johannes Franciscus Van Haren, Stefan Cornelis Theodorus Van Der Sanden | 2017-09-05 |
| 8980724 | Alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Maya Angelova Doytcheva | 2015-03-17 |
| 8709908 | Improving alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Maya Angelova Doytcheva | 2014-04-29 |
| 8625096 | Method and system for increasing alignment target contrast | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Maya Angelova Doytcheva | 2014-01-07 |
| 8208121 | Alignment mark and a method of aligning a substrate comprising such an alignment mark | Franciscus Godefridus Casper Bijnen, Patrick Warnaar, Marc Van Kemenade | 2012-06-26 |
| 5917604 | Alignment device and lithographic apparatus provided with such a device | Peter Dirksen, Jan Evert Van Der Werf | 1999-06-29 |
| 5910847 | Method of determining the radiation dose in a lithographic apparatus | Jan Evert Van Der Werf, Peter Dirksen | 1999-06-08 |
| 5673101 | Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method | Jan Evert Van Der Werf, Cornelis M. J. Van Uijen, Peter Dirksen | 1997-09-30 |
| 5485272 | Radiation-source unit for generating a beam having two directions of polarisation and two frequencies | Peter Dirksen, Jan Evert Van Der Werf | 1996-01-16 |