Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12287584 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2025-04-29 |
| 11940740 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2024-03-26 |
| 11385550 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2022-07-12 |
| 10642162 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2020-05-05 |
| 10474045 | Lithographic apparatus and device manufacturing method | Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma +6 more | 2019-11-12 |
| 10274834 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2019-04-30 |
| 9946165 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Alexander Ypma, Jasper Menger, David Deckers, David Han, Adrianus Cornelis Matheus Koopman +3 more | 2018-04-17 |
| 9753377 | Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus | Hakki Ergün Cekli, Manfred Gawein Tenner, Richard Johannes Franciscus Van Haren, Stefan Cornelis Theodorus Van Der Sanden | 2017-09-05 |
| 9454084 | Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system | Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis | 2016-09-27 |
| 9291916 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei +1 more | 2016-03-22 |
| 8982347 | Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus | Xiuhong Wei, Franciscus Godefridus Casper Bijnen, Richard Johannes Franciscus Van Haren, Marcus Adrianus Van De Kerkhof, Everhardus Cornelis Mos +4 more | 2015-03-17 |
| 8976355 | Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods | Stefan Cornelis Theodorus Van Der Sanden, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Xiuhong Wei +1 more | 2015-03-10 |