Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8980724 | Alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner | 2015-03-17 |
| 8709908 | Improving alignment target contrast in a lithographic double patterning process | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner | 2014-04-29 |
| 8625096 | Method and system for increasing alignment target contrast | Harry Sewell, Mircea Dusa, Richard Johannes Franciscus Van Haren, Manfred Gawein Tenner | 2014-01-07 |
| 8329366 | Apparatus and method for providing resist alignment marks in a double patterning lithographic process | Mircea Dusa, Richard Johannes Franciscus Van Haren, Harry Sewell, Robertus Wilhelmus Van Der Heijden | 2012-12-11 |
| 8319967 | Marker structure and method of forming the same | Richard Johannes Franciscus Van Haren, Sanjaysingh Lalbahadoersing, Sami Musa, Patrick Warnaar | 2012-11-27 |
| 6600260 | Gas discharge lamp with down conversion luminophore | Claus Feldmann, Cornelis Reinder Ronda, Thomas Justel | 2003-07-29 |