SL

Sanjaysingh Lalbahadoersing

AB Asml Netherlands B.V.: 12 patents #377 of 3,192Top 15%
📍 Helmond, NL: #24 of 250 inventorsTop 10%
Overall (All Time): #407,287 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
11675281 Methods of alignment, overlay, configuration of marks, manufacturing of patterning devices and patterning the marks Jin Dai 2023-06-13
11086232 Mark, overlay target, and methods of alignment and overlay Beniamino Sciacca, Jia Wang 2021-08-10
10948837 Information determining apparatus and method An Lin Gao, Andrey Nikipelov, Alexey Olegovich POLYAKOV, Brennan Peterson 2021-03-16
10429750 Alignment mark recovery method and lithographic apparatus Cayetano Sanchez-Fabres Cobaleda 2019-10-01
10191390 Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus Paul Cornelis Hubertus Aben, Jurgen Johannes Henderikus Maria Schoonus, David Deckers 2019-01-29
8319967 Marker structure and method of forming the same Richard Johannes Franciscus Van Haren, Sami Musa, Patrick Warnaar, Maya Angelova Doytcheva 2012-11-27
8243259 Lithographic apparatus Vitally Prosyentsov, Sami Musa, Hyun Woo Lee 2012-08-14
8203692 Sub-segmented alignment mark arrangement Sami Musa, Richard Johannes Franciscus Van Haren 2012-06-19
8072615 Alignment method, alignment system, and product with alignment mark Sami Musa, Richard Johannes Franciscus Van Haren, Xiuhong Wei 2011-12-06
7598024 Method and system for enhanced lithographic alignment Sami Musa 2009-10-06
7453161 Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatus Richard Johannes Franciscus Van Haren, Henry Megens 2008-11-18
7271073 Marker for alignment of non-transparent gate layer, method for manufacturing such a marker, and use of such a marker in a lithographic apparatus Richard Johannes Franciscus Van Haren, Henry Megens 2007-09-18