Issued Patents All Time
Showing 25 most recent of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405535 | Method for filtering an image and associated metrology apparatus | Armand Eugene Albert Koolen, Justin Kreuzer, Nikhil Mehta, Vasco Tomas Tenner, Patricius Aloysius Jacobus Tinnemans +1 more | 2025-09-02 |
| 12366811 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more | 2025-07-22 |
| 12242203 | Target for measuring a parameter of a lithographic process | Maurits Van Der Schaar, Franciscus Godefridus Casper Bijnen, Olger Victor Zwier | 2025-03-04 |
| 12197136 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2025-01-14 |
| 12112260 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Lorenzo Tripodi, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans +5 more | 2024-10-08 |
| 12105432 | Metrology method and associated computer product | Narjes JAVAHERI, Maurits Van Der Schaar, Tieh-Ming Chang, Hilko Dirk Bos, Samira Bahrami +3 more | 2024-10-01 |
| 12066764 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Maurits Van Der Schaar | 2024-08-20 |
| 12019377 | Target for measuring a parameter of a lithographic process | Maurits Van Der Schaar, Olger Victor Zwier | 2024-06-25 |
| 12007700 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more | 2024-06-11 |
| 11982946 | Metrology targets | Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier +1 more | 2024-05-14 |
| 11768442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2023-09-26 |
| 11709436 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Maurits Van Der Schaar | 2023-07-25 |
| 11650047 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Grzegorz Grzela +1 more | 2023-05-16 |
| 11526085 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan | 2022-12-13 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Abraham SLACHTER, Roy ANUNCIADO +3 more | 2022-11-29 |
| 11429029 | Method and apparatus for illumination adjustment | Maurits Van Der Schaar, Youping Zhang, Arie Jeffrey Den Boef, Feng Xiao, Martin Ebert | 2022-08-30 |
| 11415900 | Metrology system and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more | 2022-08-16 |
| 11385553 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Maurits Van Der Schaar, Elliott Gerard McNamara +6 more | 2022-07-12 |
| 11181828 | Method of determining a value of a parameter of interest of a patterning process, device manufacturing method | Hilko Dirk Bos, Hendrik Jan Hidde Smilde, Mohammadreza Hajiahmadi, Lukasz Jerzy Macht, Karel Hendrik Wouter VAN DEN BOS +2 more | 2021-11-23 |
| 11125806 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Maurits Van Der Schaar | 2021-09-21 |
| 11067902 | Computational metrology | Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Everhardus Cornelis Mos, Wim Tjibbo Tel, Marinus Jochemsen +2 more | 2021-07-20 |
| 11022892 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Simon Philip Spencer Hastings, Alberto Da Costa Assafrao, Lukasz Jerzy Macht | 2021-06-01 |
| 11009343 | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate | Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Grzegorz Grzela +1 more | 2021-05-18 |
| 11003099 | Method and apparatus for design of a metrology target | Maurits Van Der Schaar, Murat Bozkurt, Stefan Cornelis Theodorus Van Der Sanden | 2021-05-11 |
| 10996570 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Maurits Van Der Schaar, Elliott Gerard McNamara +6 more | 2021-05-04 |