Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11803127 | Method for determining root cause affecting yield in a semiconductor manufacturing process | Chenxi Lin, Cyrus E. Tabery, Hakki Ergün Cekli, Simon Philip Spencer Hastings, Boris Menchtchikov +5 more | 2023-10-31 |
| 11754931 | Method for determining corrections for lithographic apparatus | Roy Werkman, David Deckers, Simon Philip Spencer Hastings, Jeffrey Thomas Ziebarth, Samee Ur Rehman +2 more | 2023-09-12 |
| 11526085 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Patrick Warnaar | 2022-12-13 |
| 11378891 | Method for determining contribution to a fingerprint | Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse +8 more | 2022-07-05 |
| 10816904 | Method for determining contribution to a fingerprint | Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse +8 more | 2020-10-27 |
| 10739687 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Patrick Warnaar | 2020-08-11 |
| 10162271 | Metrology method and apparatus, substrate, lithographic system and device manufacturing method | Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Patrick Warnaar | 2018-12-25 |