Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360461 | Identification of hot spots or defects by machine learning | Jing Su, Yi Zou, Chenxi Lin, Stefan Hunsche, Yen-Wen Lu +1 more | 2025-07-15 |
| 12228862 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Wim Tjibbo Tel, Stefan Hunsche | 2025-02-18 |
| 12197136 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2025-01-14 |
| 11768442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2023-09-26 |
| 11681229 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Wim Tjibbo Tel, Stefan Hunsche | 2023-06-20 |
| 11520239 | Separation of contributions to metrology data | Wim Tjibbo Tel, Frank Staals, Mark John Maslow, Roy ANUNCIADO, Hugo Augustinus Joseph Cramer +2 more | 2022-12-06 |
| 11513442 | Method of determining control parameters of a device manufacturing process | Wim Tjibbo Tel, Mark John Maslow, Koenraad VAN INGEN SCHENAU, Patrick Warnaar, Abraham SLACHTER +3 more | 2022-11-29 |
| 11443083 | Identification of hot spots or defects by machine learning | Jing Su, Yi Zou, Chenxi Lin, Stefan Hunsche, Yen-Wen Lu +1 more | 2022-09-13 |
| 11442367 | Optimizing a sequence of processes for manufacturing of product units | Jochem Sebastiaan Wildenberg, Erik Weber Jensen, Erik Johannes Maria Wallerbos, Cornelis Johannes Rijnierse, Bijoy Rajasekharan +2 more | 2022-09-13 |
| 11314174 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Laurentius Cornelius De Winter, Roland Pieter Stolk, Frank Staals, Anton Bernhard Van Oosten, Paul Christiaan Hinnen +2 more | 2022-04-26 |
| 11300887 | Method to change an etch parameter | Richard Johannes Franciscus Van Haren, Victor Emanuel Calado, Leon Paul VAN DIJK, Roy Werkman, Everhardus Cornelis Mos +4 more | 2022-04-12 |
| 11106141 | Optimizing a sequence of processes for manufacturing of product units | Jochem Sebastiaan Wildenberg, Erik Weber Jensen, Erik Johannes Maria Wallerbos, Cornelis Johannes Rijnierse, Bijoy Rajasekharan +2 more | 2021-08-31 |
| 11067902 | Computational metrology | Patrick Warnaar, Patricius Aloysius Jacobus Tinnemans, Grzegorz Grzela, Everhardus Cornelis Mos, Wim Tjibbo Tel +2 more | 2021-07-20 |
| 11048174 | Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program | Michael Kubis, Richard S. Wise, Nader Shamma, Girish Dixit, Liesbeth REIJNEN +3 more | 2021-06-29 |
| 10962886 | Selection of measurement locations for patterning processes | Hans Van Der Laan, Wim Tjibbo Tel, Stefan Hunsche | 2021-03-30 |
| 10859926 | Methods for defect validation | Stefan Hunsche, Rafael Aldana Laso, Vivek Jain, Xinjian Zhou | 2020-12-08 |
| 10852646 | Displacement based overlay or alignment | Scott Anderson Middlebrooks, Stefan Hunsche, Te-Sheng WANG | 2020-12-01 |
| 10725372 | Method and apparatus for reticle optimization | Wim Tjibbo Tel, Frank Staals, Christopher PRENTICE, Laurent Michel Marcel Depre, Johannes Marcus Maria Beltman +3 more | 2020-07-28 |
| 10712672 | Method of predicting patterning defects caused by overlay error | Stefan Hunsche, Wim Tjibbo Tel | 2020-07-14 |
| 10459345 | Focus-dose co-optimization based on overlapping process window | Stefan Hunsche, Chiou-hung Jang, Vito Tomasello | 2019-10-29 |
| 10394136 | Metrology method for process window definition | Wim Tjibbo Tel | 2019-08-27 |
| 9964865 | Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus | Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li | 2018-05-08 |
| 9329491 | Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus | Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li | 2016-05-03 |
| 8405817 | Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method | Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens +16 more | 2013-03-26 |