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Identification of hot spots or defects by machine learning |
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Selection of measurement locations for patterning processes |
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Method of determining control parameters of a device manufacturing process |
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Method of determining control parameters of a device manufacturing process |
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Selection of measurement locations for patterning processes |
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2023-06-20 |
| 11520239 |
Separation of contributions to metrology data |
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Method of determining control parameters of a device manufacturing process |
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Identification of hot spots or defects by machine learning |
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Optimizing a sequence of processes for manufacturing of product units |
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Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
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Method to change an etch parameter |
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Optimizing a sequence of processes for manufacturing of product units |
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2021-08-31 |
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Computational metrology |
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Selection of measurement locations for patterning processes |
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2021-03-30 |
| 10859926 |
Methods for defect validation |
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2020-12-08 |
| 10852646 |
Displacement based overlay or alignment |
Scott Anderson Middlebrooks, Stefan Hunsche, Te-Sheng WANG |
2020-12-01 |
| 10725372 |
Method and apparatus for reticle optimization |
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Method of predicting patterning defects caused by overlay error |
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| 10459345 |
Focus-dose co-optimization based on overlapping process window |
Stefan Hunsche, Chiou-hung Jang, Vito Tomasello |
2019-10-29 |
| 10394136 |
Metrology method for process window definition |
Wim Tjibbo Tel |
2019-08-27 |
| 9964865 |
Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus |
Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li |
2018-05-08 |
| 9329491 |
Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus |
Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li |
2016-05-03 |
| 8405817 |
Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens +16 more |
2013-03-26 |
