Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417916 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise +2 more | 2025-09-16 |
| 12372872 | Extreme ultraviolet (EUV) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation | Andrew Xiao Liang, Rich Wise, Akhil Singhal, Arpan Mahorowala, Gregory Blachut +1 more | 2025-07-29 |
| 12315727 | Eliminating yield impact of stochastics in lithography | Richard Wise, Jengyi Yu, Samantha Tan | 2025-05-27 |
| 12094711 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise +2 more | 2024-09-17 |
| 11322351 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise +2 more | 2022-05-03 |
| 11257674 | Eliminating yield impact of stochastics in lithography | Richard Wise, Jengyi Yu, Samantha Tan | 2022-02-22 |
| 11048174 | Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program | Michael Kubis, Marinus Jochemsen, Richard S. Wise, Girish Dixit, Liesbeth REIJNEN +3 more | 2021-06-29 |
| 11031244 | Modification of SNO2 surface for EUV lithography | Akhil Singhal, Dustin Zachary Austin | 2021-06-08 |
| 10796912 | Eliminating yield impact of stochastics in lithography | Richard Wise, Jengyi Yu, Samantha Tan | 2020-10-06 |
| 10685836 | Etching substrates using ALE and selective deposition | Samantha Tan, Jengyi Yu, Richard Wise, Yang Pan | 2020-06-16 |
| 10546748 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Samantha Tan, Yu Jiang, Hui-Jung Wu, Richard Wise +2 more | 2020-01-28 |
| 10438807 | Low roughness EUV lithography | Richard Wise | 2019-10-08 |
| 10269566 | Etching substrates using ale and selective deposition | Samantha Tan, Jengyi Yu, Richard Wise, Yang Pan | 2019-04-23 |
| 10192759 | Image reversal with AHM gap fill for multiple patterning | Bart J. van Schravendijk, Sirish Reddy, Chunhai Ji | 2019-01-29 |
| 10192742 | Soft landing nanolaminates for advanced patterning | Frank L. Pasquale, Shankar Swaminathan, Adrien LaVoie, Girish Dixit | 2019-01-29 |
| 9922839 | Low roughness EUV lithography | Richard Wise | 2018-03-20 |
| 9905423 | Soft landing nanolaminates for advanced patterning | Frank L. Pasquale, Shankar Swaminathan, Adrien LaVoie, Girish Dixit | 2018-02-27 |
| 9618846 | PECVD films for EUV lithography | Thomas W. Mountsier, Donald K. Schlosser | 2017-04-11 |
| 9390909 | Soft landing nanolaminates for advanced patterning | Frank L. Pasquale, Shankar Swaminathan, Adrien LaVoie, Girish Dixit | 2016-07-12 |
| 9362133 | Method for forming a mask by etching conformal film on patterned ashable hardmask | Bart J. van Schravendijk, Sirish Reddy, Chunhai Ji | 2016-06-07 |
| 9304396 | PECVD films for EUV lithography | Thomas W. Mountsier, Don Schlosser | 2016-04-05 |
| 5331370 | Method and apparatus for determining a feature-forming variant of a lithographic system | S. Jeffrey Rosner, Frederik Sporon-Fiedler | 1994-07-19 |
| 5208124 | Method of making a mask for proximity effect correction in projection lithography | Frederik Sporon-Fiedler, Edward Lin | 1993-05-04 |