Issued Patents All Time
Showing 25 most recent of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12421602 | Multi-station semiconductor processing with independently adjustable pedestals | Jennifer Leigh Petraglia, Dinesh Baskar, Adrien LaVoie | 2025-09-23 |
| 12291777 | Throughput improvement with interval conditioning purging | Chun-Hao Chen, Jeremy David Fields | 2025-05-06 |
| 12270103 | Plasma-enhanced atomic layer deposition with radio-frequency power ramping | Jeremy David Fields | 2025-04-08 |
| 12252782 | In-situ PECVD cap layer | Jeremy David Fields, Ian John Curtin, Joseph R. Abel, Douglas Walter Agnew | 2025-03-18 |
| 12057300 | Apparatus for cleaning plasma chambers | Adrien LaVoie, Pulkit Agarwal, Purushottam Kumar | 2024-08-06 |
| 11959172 | Substrate processing systems including gas delivery system with reduced dead legs | Ramesh Chandrasekharan, Antonio Xavier, Ryan Blaquiere, Jennifer Leigh Petraglia, Meenakshi Mamunuru | 2024-04-16 |
| 11959175 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2024-04-16 |
| 11661654 | Substrate processing systems including gas delivery system with reduced dead legs | Ramesh Chandrasekharan, Antonio Xavier, Ryan Blaquiere, Jennifer Leigh Petraglia, Meenakshi Mamunuru | 2023-05-30 |
| 11443975 | Planar substrate edge contact with open volume equalization pathways and side containment | Patrick Breiling, Ramesh Chandrasekharan, Karl Leeser, Paul Konkola, Adrien LaVoie +7 more | 2022-09-13 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2021-09-21 |
| 11078570 | Azimuthal critical dimension non-uniformity for double patterning process | Pulkit Agarwal, Adrien LaVoie, Ravi Kumar | 2021-08-03 |
| 11072860 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2021-07-27 |
| 10741365 | Low volume showerhead with porous baffle | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Hu Kang, Adrien LaVoie | 2020-08-11 |
| 10679848 | Selective atomic layer deposition with post-dose treatment | Purushottam Kumar, Adrien LaVoie, Ishtak Karim, Jun Qian, Bart J. van Schravendijk | 2020-06-09 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2020-05-26 |
| 10622243 | Planar substrate edge contact with open volume equalization pathways and side containment | Patrick Breiling, Ramesh Chandrasekharan, Karl Leeser, Paul Konkola, Adrien LaVoie +7 more | 2020-04-14 |
| 10541117 | Systems and methods for tilting a wafer for achieving deposition uniformity | Shankar Swaminathan, Pramod Subramonium, Jeongseok Ha, Chloe Baldasseroni | 2020-01-21 |
| 10526700 | Hardware and process for film uniformity improvement | Purushottam Kumar, Hu Kang, Adrien LaVoie, Yi Chung Chiu, Jun Qian +5 more | 2020-01-07 |
| 10418236 | Composite dielectric interface layers for interconnect structures | Kapu Sirish Reddy, Nagraj Shankar, Shankar Swaminathan, Meliha Gozde Rainville | 2019-09-17 |
| 10407773 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Adrien LaVoie, Hu Kang, Purushottam Kumar, Shankar Swaminathan, Jun Qian +1 more | 2019-09-10 |
| 10378107 | Low volume showerhead with faceplate holes for improved flow uniformity | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Hu Kang, Adrien LaVoie +6 more | 2019-08-13 |
| 10323323 | Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition | Ramesh Chandrasekharan, Jennifer O'Loughlin, Saangrut Sangplung, Shankar Swaminathan, Chloe Baldasseroni +1 more | 2019-06-18 |
| 10192742 | Soft landing nanolaminates for advanced patterning | Shankar Swaminathan, Adrien LaVoie, Nader Shamma, Girish Dixit | 2019-01-29 |
| 10100407 | Hardware and process for film uniformity improvement | Purushottam Kumar, Hu Kang, Adrien LaVoie, Yi Chung Chiu, Jun Qian +5 more | 2018-10-16 |
| 10062563 | Selective atomic layer deposition with post-dose treatment | Purushottam Kumar, Adrien LaVoie, Ishtak Karim, Jun Qian, Bart J. van Schravendijk | 2018-08-28 |