Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12421602 | Multi-station semiconductor processing with independently adjustable pedestals | Frank L. Pasquale, Dinesh Baskar, Adrien LaVoie | 2025-09-23 |
| 12412742 | Impurity reduction in silicon-containing films | Awnish Gupta, Bart J. van Schravendijk, Jason Alexander Varnell, Joseph R. Abel, Adrien LaVoie | 2025-09-09 |
| 12385138 | Plasma-enhanced deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox +5 more | 2025-08-12 |
| 11959175 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2024-04-16 |
| 11959172 | Substrate processing systems including gas delivery system with reduced dead legs | Ramesh Chandrasekharan, Antonio Xavier, Frank L. Pasquale, Ryan Blaquiere, Meenakshi Mamunuru | 2024-04-16 |
| 11661654 | Substrate processing systems including gas delivery system with reduced dead legs | Ramesh Chandrasekharan, Antonio Xavier, Frank L. Pasquale, Ryan Blaquiere, Meenakshi Mamunuru | 2023-05-30 |
| 11236422 | Multi zone substrate support for ALD film property correction and tunability | Michael Philip Roberts, Ramesh Chandrasekharan, Pulkit Agarwal, Aaron Bingham, Ashish Saurabh +1 more | 2022-02-01 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2021-09-21 |
| 11072860 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2021-07-27 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2020-05-26 |
| 10378107 | Low volume showerhead with faceplate holes for improved flow uniformity | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Hu Kang +6 more | 2019-08-13 |
| 10214816 | PECVD apparatus for in-situ deposition of film stacks | Jason Dirk Haverkamp, Pramod Subramonium, Joseph L. Womack, Dong Niu, Keith Fox +5 more | 2019-02-26 |
| 9793096 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2017-10-17 |
| 9677176 | Multi-plenum, dual-temperature showerhead | Ramesh Chandrasekharan | 2017-06-13 |
| 9624578 | Method for RF compensation in plasma assisted atomic layer deposition | Jun Qian, Frank L. Pasquale, Adrien LaVoie, Chloe Baldasseroni, Hu Kang +7 more | 2017-04-18 |