Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12431349 | In-situ control of film properties during atomic layer deposition | Douglas Walter Agnew, Ian John Curtin, Purushottam Kumar, Awnish Gupta | 2025-09-30 |
| 12417943 | Reducing intralevel capacitance in semiconductor devices | Bart J. van Schravendijk, Ian John Curtin, Douglas Walter Agnew, Dustin Zachary Austin, Awnish Gupta | 2025-09-16 |
| 12412742 | Impurity reduction in silicon-containing films | Awnish Gupta, Bart J. van Schravendijk, Jason Alexander Varnell, Jennifer Leigh Petraglia, Adrien LaVoie | 2025-09-09 |
| 12400880 | Apparatuses for uniform fluid delivery in a multi-station semiconductor processing chamber | Eli Jeon, Michael Philip Roberts, Douglas Walter Agnew, Daniel Boatright, Arun Anandhan Duraisamy +1 more | 2025-08-26 |
| 12322619 | Dynamic process control in semiconductor manufacturing | Purushottam Kumar, Tengfei Miao, Gengwei Jiang, Daniel Ho, Siddappa Attur +1 more | 2025-06-03 |
| 12288685 | Modifying hydrophobicity of a wafer surface using an organosilicon precursor | Jeremy David Fields, Awnish Gupta, Douglas Walter Agnew, Purushottam Kumar | 2025-04-29 |
| 12252782 | In-situ PECVD cap layer | Jeremy David Fields, Ian John Curtin, Frank L. Pasquale, Douglas Walter Agnew | 2025-03-18 |
| 12125705 | Method for providing doped silicon using a diffusion barrier layer | Purushottam Kumar, Gengwei Jiang, Bart J. van Schravendijk, Tengfei Miao, Adrien LaVoie | 2024-10-22 |
| 12087574 | Oxidative conversion in atomic layer deposition processes | Douglas Walter Agnew, Bart J. van Schravendijk | 2024-09-10 |
| 12049699 | Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching | Purushottam Kumar, Bart J. van Schravendijk, Adrien LaVoie | 2024-07-30 |
| 12020923 | Low-κ ALD gap-fill methods and material | Douglas Walter Agnew, Adrien LaVoie, Ian John Curtin, Purushottam Kumar | 2024-06-25 |
| 11651963 | Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film | Ishtak Karim, Pulkit Agarwal, Purushottam Kumar, Adrien LaVoie | 2023-05-16 |
| 11373862 | Surface modified depth controlled deposition for plasma based deposition | Adrien LaVoie, Purushottam Kumar | 2022-06-28 |
| 11293098 | Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching | Purushottam Kumar, Bart J. van Schravendijk, Adrien LaVoie | 2022-04-05 |
| 10978302 | Method of improving deposition induced CD imbalance using spatially selective ashing of carbon based film | Ishtak Karim, Pulkit Agarwal, Purushottam Kumar, Adrien LaVoie | 2021-04-13 |
| 10727046 | Surface modified depth controlled deposition for plasma based deposition | Adrien LaVoie, Purushottam Kumar | 2020-07-28 |
| 10658172 | Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer | Pulkit Agarwal, Richard Phillips, Purushottam Kumar, Adrien LaVoie | 2020-05-19 |
| 10636686 | Method monitoring chamber drift | Purushottam Kumar, Adrien LaVoie | 2020-04-28 |
| 10269559 | Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer | Pulkit Agarwal, Richard Phillips, Purushottam Kumar, Adrien LaVoie | 2019-04-23 |
| 9495069 | Expanded icon functionality | Miguel Angel Escobedo | 2016-11-15 |