| 12431349 |
In-situ control of film properties during atomic layer deposition |
Douglas Walter Agnew, Joseph R. Abel, Ian John Curtin, Purushottam Kumar |
2025-09-30 |
| 12417943 |
Reducing intralevel capacitance in semiconductor devices |
Joseph R. Abel, Bart J. van Schravendijk, Ian John Curtin, Douglas Walter Agnew, Dustin Zachary Austin |
2025-09-16 |
| 12412742 |
Impurity reduction in silicon-containing films |
Bart J. van Schravendijk, Jason Alexander Varnell, Joseph R. Abel, Jennifer Leigh Petraglia, Adrien LaVoie |
2025-09-09 |
| 12288685 |
Modifying hydrophobicity of a wafer surface using an organosilicon precursor |
Jeremy David Fields, Douglas Walter Agnew, Joseph R. Abel, Purushottam Kumar |
2025-04-29 |
| 12157945 |
Thermal atomic layer deposition of silicon-containing films |
Tengfei Miao, Adrien LaVoie, Douglas Walter Agnew, Ian John Curtin |
2024-12-03 |
| 12037686 |
Selective carbon deposition |
Adrien LaVoie, Bart J. van Schravendijk, Samantha Tan |
2024-07-16 |
| 10615169 |
Selective deposition of SiN on horizontal surfaces |
Bart J. van Schravendijk, Patrick A. Van Cleemput, Jason D. Park |
2020-04-07 |
