| 12315727 |
Eliminating yield impact of stochastics in lithography |
Nader Shamma, Richard Wise, Jengyi Yu |
2025-05-27 |
|
| 12293919 |
Alternating etch and passivation process |
Seongjun Heo, Jengyi Yu, Chen-Wei Liang, Alan J. Jensen |
2025-05-06 |
|
| 12131909 |
Selective processing with etch residue-based inhibitors |
Kashish Sharma, Taeseung Kim, Dennis M. Hausmann |
2024-10-29 |
$201,698,000 |
| 12062538 |
Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
Jengyi Yu, Liu-Yang Yang, Chen-Wei Liang, Boris Volosskiy, Richard Wise +4 more |
2024-08-13 |
$174,384,000 |
| 11988965 |
Underlayer for photoresist adhesion and dose reduction |
Jun Xue, Mary Anne Manumpil, Jengyi Yu, Da Li |
2024-05-21 |
$220,329,000 |
| 11848212 |
Alternating etch and passivation process |
Seongjun Heo, Jengyi Yu, Chen-Wei Liang, Alan J. Jensen |
2023-12-19 |
$251,346,000 |
| 11823909 |
Selective processing with etch residue-based inhibitors |
Kashish Sharma, Taeseung Kim, Dennis M. Hausmann |
2023-11-21 |
$115,339,000 |
| 11551938 |
Alternating etch and passivation process |
Seongjun Heo, Jengyi Yu, Chen-Wei Liang, Alan J. Jensen |
2023-01-10 |
$278,941,000 |
| 11314168 |
Underlayer for photoresist adhesion and dose reduction |
Jun Xue, Mary Anne Manumpil, Jengyi Yu, Da Li |
2022-04-26 |
$509,293,000 |
| 11257674 |
Eliminating yield impact of stochastics in lithography |
Nader Shamma, Richard Wise, Jengyi Yu |
2022-02-22 |
$165,169,000 |
| 11062897 |
Metal doped carbon based hard mask removal in semiconductor fabrication |
Yongsik Yu, David Cheung, Kirk Ostrowski, Nikkon Ghosh, Karthik S. Colinjivadi +2 more |
2021-07-13 |
$378,432,000 |
| 10796912 |
Eliminating yield impact of stochastics in lithography |
Nader Shamma, Richard Wise, Jengyi Yu |
2020-10-06 |
$171,004,000 |
| 9391267 |
Method to etch non-volatile metal materials |
Meihua Shen, Harmeet Singh, Jeffrey Marks, Thorsten Lill, Richard Janek +2 more |
2016-07-12 |
$14,257,000 |
| 9257638 |
Method to etch non-volatile metal materials |
Wenbing Yang, Meihua Shen, Richard Janek, Jeffrey Marks, Harmeet Singh +1 more |
2016-02-09 |
$11,583,000 |
| 9130158 |
Method to etch non-volatile metal materials |
Meihua Shen, Harmeet Singh, Jeffrey Marks, Thorsten Lill, Richard Janek +2 more |
2015-09-08 |
$7,662,000 |
| 8691023 |
Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
Liyuan Bao, Anbei Jiang |
2014-04-08 |
|
| 8492674 |
Methods and apparatus for ex situ seasoning of electronic device manufacturing process components |
Jiansheng Wang |
2013-07-23 |
|
| 8398779 |
Non destructive selective deposition removal of non-metallic deposits from aluminum containing substrates |
Liyuan Bao, Anbei Jiang, Sio On Lo, Yukari Nishimura, Joseph F. Sommers |
2013-03-19 |
$6,887,000 |
| 8097089 |
Methods for cleaning process kits and chambers, and for ruthenium recovery |
Jianqi Wang |
2012-01-17 |
|
| 7789969 |
Methods and apparatus for cleaning chamber components |
Felix Rabinovich, Thomas Echols, Janet Maleski, Ning Chen |
2010-09-07 |
$5,434,000 |
| 7754609 |
Cleaning processes for silicon carbide materials |
— |
2010-07-13 |
$12,099,000 |
| 7452475 |
Cleaning process and apparatus for silicate materials |
Ning Chen |
2008-11-18 |
$14,778,000 |
| 7377991 |
Ultrasonic assisted etch using corrosive liquids |
Ning Chen |
2008-05-27 |
$25,876,000 |
| 7091132 |
Ultrasonic assisted etch using corrosive liquids |
Ning Chen |
2006-08-15 |
$45,587,000 |
| 7045072 |
Cleaning process and apparatus for silicate materials |
Ning Chen |
2006-05-16 |
|
